journal article·2016-07

Remote Plasma Cleaning and Radical Recombination Rates

Ronald Vane, Ewa Kosmowska

Microscopy and Microanalysis· Volume 22· Issue S3
Publisher page

Abstract

Ronald Vane, Ewa Kosmowska; Remote Plasma Cleaning and Radical Recombination Rates, Microscopy and Microanalysis, Volume 22, Issue S3, 1 July 2016, Pages 4
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short

Research context

OpenAlex topics: Catalytic Processes in Materials Science

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References

Reference metadata was not supplied for this record.