Characterization of VLSI Processing Defects Using STEM-EELS Tomography
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Abstract
Frieder H Baumann, John Miller, Bryan Rhoads, Anne Friedman, Bianzhu Fu; Characterization of VLSI Processing Defects Using STEM-EELS Tomography, Microscopy
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Electron and X-Ray Spectroscopy Techniques · Semiconductor materials and devices
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References (3)
Show source-provided references
1. 1998 · vol 2 · 123
2. Microscopy and Analysis · 2012 · 116 · 23
3. 10.1016/j.micron.2013.01.00410.1016/j.micron.2013.01.004 ↗