Staining Block Copolymers using Sequential Infiltration Synthesis for High Contrast Imaging and STEM tomography
Source abstract
Abstract
T Segal-Peretz, J Winterstein, M Biswas, JA Liddle, Jeffrey W Elam, N J Zaluzec, PF Nealey; Staining Block Copolymers using Sequential Infiltration Synthes
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Block Copolymer Self-Assembly · Advancements in Photolithography Techniques · Integrated Circuits and Semiconductor Failure Analysis
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References (1)
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1. 10.1002/adma.20100246510.1002/adma.201002465 ↗