A Comparison of Xenon Plasma FIB Technology with Conventional Gallium LMIS FIB: Imaging, Milling, and Gas-Assisted Applications
Source abstract
Abstract
Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.
Only a short abstract or summary was supplied by the source.
Source: crossref · Quality: short
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Advanced Materials Characterization Techniques · Advanced Electron Microscopy Techniques and Applications
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