journal article·2011-09-30

Resistance-switching behaviour in ZnO–Nb 2 O 5 thin films for non-volatile memory application

Cheng-Hsing Hsu, Shu-Fong Yan

Micro & Nano Letters· Volume 6· Issue 9
Publisher page

Abstract

The microstructure and resistance switching characteristics of polycrystalline ZnO–Nb2O5 thin films prepared by the sol–gel method on indium tin oxide (ITO)/glass substrates at different annealing temperatures followed by annealing in oxygen have been investigated. The selected-area diffraction pattern showed that the deposited films exhibited a polycrystalline microstructure. The Pt/ZnO–Nb2O5/ITO/glass device exhibits reversible and steady bistable resistance switching behaviour with a narrow dispersion of resistance states and switching voltages. The resistance ratios of high-resistance state to low-resistance state were in the range of 1–2 orders of magnitude within 200 test cycles.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Transition Metal Oxide Nanomaterials · Gas Sensing Nanomaterials and Sensors

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Electrical Engineering, National United University, No. 1 Lien-Da, Kung-Ching Li, Miao-Li, 36003, Taiwan

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