Formation of β-Be3N2 nanocrystallites in Be-implanted GaN
Source abstract
Abstract
Abstract A small Be ion dose of 5 × 1014 cm−2 was implanted in a 2 μm thick GaN epilayer at an energy of 50 keV. The sample was characterized by high-resolution transmission electron microscopy (HRTEM) and Raman spectroscopy techniques after a post-implantation rapid thermal annealing (RTA) treatment. The HRTEM images show the crystallographic (1 1 0) and (0 0 2) planes of β-Be3N2. Two characteristic parallelograms drawn in Fast Fourier transform (FFT) image support the formation of β-Be3N2 nanocrystallites in RTA treated sample. Two Raman peaks at 168 and 199 cm−1 are observed in the Raman spectrum of the sample that are assigned to β-Be3N2 on the basis of group theory and HRTEM data. The Raman peak at 168 cm−1 is found close to the K point in the first Brillouin zone of β-Be3N2 while the peak at 199 cm−1 is assigned as a combination mode of the fundamental Raman modes of β-Be3N2.
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Research context
OpenAlex topics: GaN-based semiconductor devices and materials · MXene and MAX Phase Materials · Semiconductor materials and devices
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