The influence of electro-deposition parameters on conductivity and morphology of structurally uniform MWCNTs/Cu composite films

Copper matrix carbon nanotubes composite films were fabricated by an electro-deposition process using copper plating solution containing homogeneously dispersed Multi-wall carbon nanotubes (MWCNTs) with by ultrasound assisted. The technological parameters, such as MWCNTs concentration in the solution, pH, pulse current density and ultrasound assisted were studied. When the concentration of MWCNTs was 2 g L −1 , the films were fine-grained and distributed uniformly. The highest content of MWCNTs in films was at the pH between 2 and 5, The MWCNTs network formed on the Cu coating at the pulse current density equal to 20 A dm −2 . The resistivity of composite films gradually decreased with increase in MWCNTs content. The structure of MWCNTs did not change during the electro-deposition. Electrical properties of both MWCNTs/Cu films and pure Cu were investigated after annealing at different temperatures. Results show that the resistance of the MWCNTs/Cu composite films reached minimum value after annealing at 400 °C.