Study of the structural properties of nanostructured PbS thin films deposited by RF sputtering at room temperature

In this work nanostructured PbS thin films were deposited on glass substrates at room temperature by radio frequency sputtering technique varying the power from 50 to 150 W while the other parameters were kept constant (Argon flow at 80 sccm for 30 min). It was observed by x-ray diffraction that they have a preferential growth in the (200) direction. Through atomic force microscopy (AFM) it was proved that the films present a nanostructured growth, with particle size between 6 and 8 nm. So it can be said that nanostructured thin films of PbS have been obtained by physical methods at room temperature for future application in solar cells.