journal article·2025-06

Influence of trace tungsten contents on thin-film properties and electromigration behaviors of electroless-deposited cobalt interconnect lines

Jau-Shiung Fang, Ting-Hsun Su, Yi-Lung Cheng, Chun-Wei Huang, Giin-Shan Chen

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OpenAlex topics: Copper Interconnects and Reliability · Electrodeposition and Electroless Coatings · Electronic Packaging and Soldering Technologies

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