journal article·2011-01

A study on the structural and mechanical properties of nanocrystalline CuS thin films grown by chemical bath deposition technique

Nillohit Mukherjee, Arijit Sinha, Gobinda Gopal Khan, Debraj Chandra, Asim Bhaumik, Anup Mondal

Materials Research Bulletin· Volume 46· Issue 1
Publisher page

Abstract

We report a chemical route for the deposition of nanocrystalline thin films of CuS, using aqueous solutions of Cu(CH3COO)2, SC(NH2)2 and N(CH2CH2OH)3 [triethanolamine, i.e. TEA] in proper concentrations and ratios. The films were structurally characterized using X-ray diffraction technique (XRD), field emission scanning electron microscopy (FESEM) and optical analysis [both photo luminescence (PL) and ultraviolet–visible (UV–vis)]. Optical studies showed a large blue shift in the band gap energy of the films due to quantum confinement effect exerted by the nanocrystals. From both XRD and FESEM analyses, formation of CuS nanocrystals with sizes within 10–15 nm was evident. A study on the mechanical properties was carried out using nanoindentation and nanoscratch techniques, which showed good mechanical stability and high adherence of the films with the bottom substrate. Such study on the mechanical properties of the CuS thin films is being reported here for the first time. Current–voltage (I–V) measurements were also carried out for the films, which showed p-type conductivity.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Chalcogenide Semiconductor Thin Films · Copper-based nanomaterials and applications · Quantum Dots Synthesis And Properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

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