journal article·2009-01Open access

Nanostructured zinc oxide films synthesized by successive chemical solution deposition for gas sensor applications

O. Lupan, L. Chow, S. Shishiyanu, E. Monaico, T. Shishiyanu, V. Şontea, B. Roldan Cuenya, A. Naitabdi, S. Park, A. Schulte

Materials Research Bulletin· Volume 44· Issue 1

Abstract

Nanostructured ZnO thin films have been deposited using a successive chemical solution deposition method. The structural, morphological, electrical and sensing properties of the films were studied for different concentrations of Al-dopant and were analyzed as a function of rapid photothermal processing temperatures. The films were investigated by X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy, X-ray photoelectron and micro-Raman spectroscopy. Electrical and gas sensitivity measurements were conducted as well. The average grain size is 240 and 224 Å for undoped ZnO and Al-doped ZnO films, respectively. We demonstrate that rapid photothermal processing is an efficient method for improving the quality of nanostructured ZnO films. Nanostructured ZnO films doped with Al showed a higher sensitivity to carbon dioxide than undoped ZnO films. The correlations between material compositions, microstructures of the films and the properties of the gas sensors are discussed.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: ZnO doping and properties · Gas Sensing Nanomaterials and Sensors · Copper-based nanomaterials and applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (57)

Show source-provided references
1. Özgür · J. Appl. Phys. · 2005 · 98 · 04130110.1063/1.1992666 ↗
2. Keis · Sol. Energy Mater. Sol. Cells · 2002 · 73 · 5110.1016/S0927-0248(01)00110-6 ↗
3. Mergerian · IEEE Ultrasonics Symp. · 1978 · 64
4. Oh · J. Appl. Phys. · 2006 · 99 · 12450510.1063/1.2206417 ↗
5. Chen · Mater. Sci. Eng. B · 2001 · 85 · 21210.1016/S0921-5107(01)00584-0 ↗
6. Jin · J. Mater. Sci. Lett. · 2003 · 22 · 97110.1023/A:1024612929936 ↗
7. Shiosaki · Electron Device Meeting Int. · 1979 · 25 · 151
8. Kim · Ultrasonics Symp. IEEE Proc. · 1998 · 1 · 323
9. Nanto · J. Mater. Sci. · 1994 · 29 · 652910.1007/BF00354016 ↗
10. Tai · J. Mater. Sci.: Mater. Electron. · 2002 · 13 · 391
11. Hong · Sens. Actuators B · 2000 · 66 · 4910.1016/S0925-4005(99)00460-8 ↗
12. Hofmann · Sens. Actuators B · 1997 · 41 · 8110.1016/S0925-4005(97)80280-8 ↗
13. Keis · 2001
14. Singh · J. Appl. Phys. · 2004 · 95 · 364010.1063/1.1667259 ↗
15. Tolstoy · Russ. Chem. Rev. · 2006 · 75 · 16110.1070/RC2006v075n02ABEH001197 ↗
16. Rensmo · J. Phys. Chem. B · 1997 · 101 · 259810.1021/jp962918b ↗
17. Afzaal · J. Mater. Chem. · 2006 · 16 · 159710.1039/B512182E ↗
18. Govender · J. Mater. Chem. · 2004 · 14 · 257510.1039/B404784B ↗
19. Mitra · J. Mater. Sci.: Mater. Electron. · 1998 · 9 · 441
20. Lindroos · Int. J. Inorg. Mater. · 2000 · 2 · 19710.1016/S1466-6049(00)00017-9 ↗
21. Lupan · Thin Solid Films · 2008 · 516 · 333810.1016/j.tsf.2007.10.104 ↗
22. Chou · Thin Solid Films · 2006 · 494 · 29110.1016/j.tsf.2005.08.231 ↗
23. Shishiyanu · Sens. Actuators B · 2005 · 107 · 37910.1016/j.snb.2004.10.030 ↗
24. Rakshani · Appl. Phys. A · 2005 · 81 · 149710.1007/s00339-005-3288-z ↗
25. Rakshani · Appl. Phys. A · 2007 · 86 · 37710.1007/s00339-006-3785-8 ↗
26. Muhammed · J. Kor. Ceram. Soc. · 2003 · 40 · 102710.4191/KCERS.2003.40.11.1027 ↗
27. Niesen · J. Electroceram. · 2001 · 6 · 16910.1023/A:1011496429540 ↗
28. Shishiyanu · Electrochim. Acta · 2004 · 49 · 443310.1016/j.electacta.2004.04.034 ↗
29. Shishiyanu · Thin Solid Films · 2005 · 488 · 1510.1016/j.tsf.2005.04.004 ↗
30. Lupan · 2002 · 149
31. Lindroos · 1998 · 43
32. Joint Committee on Powder Diffraction Standards, Powder Diffraction File No. 036-1451.
33. Mahalingam · Nanotechnology · 2007 · 18 · 03560610.1088/0957-4484/18/3/035606 ↗
34. Deng · Thin Solid Films · 2004 · 458 · 4310.1016/j.tsf.2003.11.288 ↗
35. Qiang · Mater. Sci. Semicond. Proc. · 2006 · 9 · 13210.1016/j.mssp.2006.01.082 ↗
36. Wang · J. Appl. Phys. · 2003 · 94 · 159710.1063/1.1592007 ↗
37. Senadin · J. Phys.: Condens. Matter · 2006 · 18 · 6391
38. West · 1984
39. Minami · J. Cryst. Growth · 1992 · 117 · 37010.1016/0022-0248(92)90778-H ↗
40. Lin · Surf. Coat. Tech. · 2004 · 185 · 25410.1016/j.surfcoat.2003.12.007 ↗
41. Battistoni · Solid State Commun. · 1981 · 39 · 58110.1016/0038-1098(81)90326-4 ↗
42. Gaarenstroom · J. Chem. Phys. · 1977 · 67 · 350010.1063/1.435347 ↗
43. Paparazzo · J. Phys. D · 1987 · 20 · 109110.1088/0022-3727/20/8/022 ↗
44. Säuberlich · Thin Solid Films · 2003 · 431/432 · 37810.1016/S0040-6090(03)00251-7 ↗
45. Xing · Appl. Phys. Lett. · 2003 · 83 · 168910.1063/1.1605808 ↗
46. Qiu · Appl. Surf. Sci. · 2004 · 222 · 26310.1016/j.apsusc.2003.08.015 ↗
47. Chen · Mater. Sci. Eng. B · 2001 · 85 · 21210.1016/S0921-5107(01)00584-0 ↗
48. Pei · J. Appl. Phys. · 2001 · 90 · 343210.1063/1.1398070 ↗
49. Postava · Appl. Surf. Sci. · 2001 · 175/176 · 54310.1016/S0169-4332(01)00145-3 ↗
50. Takata · Thin Solid Films · 1986 · 135 · 18310.1016/0040-6090(86)90125-2 ↗
51. Joseph · Ceram. Int. · 2006 · 32 · 48710.1016/j.ceramint.2005.03.029 ↗
52. Mizuhashi · Thin Solid Films · 1981 · 76 · 9710.1016/0040-6090(81)90240-6 ↗
53. ISBT Carbon Dioxide Quality Guidelines and Analytical Procedure Bibliography, International Society of Beverage Technologists, USA, March 2001.
54. Hartnagel · 1995
55. Riu · Talanta · 2006 · 69 · 28810.1016/j.talanta.2005.09.045 ↗
56. Raju · Sens. Actuators B · 1991 · 3 · 30510.1016/0925-4005(91)80021-B ↗
57. Kröger · 1985 · 1