A novel developed plasma processing of optical components in closed chamber without aggressive reagents: Polishing performance, removal analysis and its characterization
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OpenAlex topics: Advanced Surface Polishing Techniques · Metal and Thin Film Mechanics · Integrated Circuits and Semiconductor Failure Analysis
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References (9)
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1. New development of atmospheric pressure plasma polishing
2. Parametric optimisation of plasma polishing process using response surface methodology
3. Application of atmospheric pressure plasma polishing method in machining of silicon ultra-smooth surfaces10.1007/s11460-008-0072-9 ↗
4. Optimization and test of a ring-ring typed atmospheric pressure plasma jet for optical fabrication10.1016/j.precisioneng.2024.04.013 ↗
5. Results in Engineering A proposed methodology to develop digital twin framework for plasma processing10.1016/j.rineng.2024.103462 ↗
6. Numerical simulation and experimental investigation of novel developed medium-pressure plasma polishing process of fused silica10.1016/j.ceramint.2025.01.109 ↗
7. Mechanism and technological opportunity of plasma electrolytic polishing of metals and alloys surfaces10.1016/j.apsadv.2020.100016 ↗
8. Design and development of medium-pressure plasma process for optical substrate finishing: A comparative study with wet chemical etching10.1016/j.jmapro.2023.12.034 ↗
9. Theoretical and experimental study on plasma-induced atom-migration manufacturing (PAMM) of glass10.1016/j.apsusc.2022.153976 ↗