journal article·2022-01Open access

Magnetic enhancement and nitriding process of Fe atomic layers on Si 111-7 × 7-CH3OH surface

Wenxin Li, Wanyu Ding, Jiawen Wang, Youping Gong, Dongying Ju

Materials Letters· Volume 306

Abstract

Aim to greatly enhance the magnetic performance, room temperature nitriding experiments were implemented on the existing linear Fe clusters. Firstly, the dissociation of CH3OH adsorption process was deducted in detail, which laid a good foundation for the better use of surface quasi-potential. Further to solve the coming problems like weak linearity and low nitriding effect, atomic layers of Fe deposition are confirmed as the key to NH3 dissociation process (at room temperature). Specifically, the higher Fe atomic layer contacted by NH3, the weaker influence of surface quasi-potential. With the introduction of Ar, Fe cluster structure could be precisely controlled at single atomic layer, result in good NH3 dissociation and nitriding efficiency. Combining with magnetic performance result, the density of residual magnetization is improved from 1.5E−0.5 emu to 7.0E−0.5 emu, forming an obvious linear structure.
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Research context

OpenAlex topics: Magnetic properties of thin films · ZnO doping and properties · Copper-based nanomaterials and applications

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References (21)

Show source-provided references
1. Tanaka · J. Chem. Phys. · 2004 · 120 · 448610.1063/1.1644105 ↗
2. Structure and properties of spinel Fe3N4 and comparison to zinc blende FeN10.1063/1.1473691 ↗
3. Hidalgo · Nanotechnology · 2005 · 16 · 252110.1088/0957-4484/16/11/010 ↗
4. Merino · ACS Nano · 2011 · 5 · 562710.1021/nn201200j ↗
5. Corso · Science · 2004 · 303 · 21710.1126/science.1091979 ↗
6. Ahmadi · Science · 1996 · 272 · 192410.1126/science.272.5270.1924 ↗
7. Szajewski · Comp. Mater. Sci. · 2018 · 147 · 24310.1016/j.commatsci.2018.02.021 ↗
8. Borca · J. Phys.-Condens. Mat. · 2009 · 2110.1088/0953-8984/21/13/134002 ↗
9. Ienaga · Phys. Rev. B · 2017 · 9610.1103/PhysRevB.96.085439 ↗
10. Anjum · Appl. Phys. A · 2018 · 124 · 4910.1007/s00339-017-1456-6 ↗
11. Ding · Nanoscale Res. Lett. · 2014 · 9 · 37710.1186/1556-276X-9-377 ↗
12. Tao · Mater. Lett. · 2019 · 239 · 14010.1016/j.matlet.2018.12.089 ↗
13. Meka · Metall. Mater. Trans. A · 2020 · 51 · 315410.1007/s11661-020-05713-4 ↗
14. Olshanetsky · Surf. Sci. · 1994 · 306 · 32710.1016/0039-6028(94)90075-2 ↗
15. Tsai · Appl. Phys. Lett. · 1997 · 71 · 149510.1063/1.119947 ↗
16. Yang · J. Phys. Soc. Jpn. · 2018 · 8710.7566/JPSJ.87.034601 ↗
17. Tanaka · Surf. Sci. · 2007 · 601 · 509310.1016/j.susc.2007.04.191 ↗
18. Li · Materials · 2018 · 11 · 159310.3390/ma11091593 ↗
19. Li · Coatings · 2021 · 11 · 28110.3390/coatings11030281 ↗
20. Samanta · J. Mater. Sci.-Mater. El. · 2018 · 29 · 2038310.1007/s10854-018-0173-z ↗
21. Zhou · Chem. Soc. Rev. · 2015 · 44 · 669710.1039/C5CS00033E ↗