DataVXMaterials LettersPaper
journal article·2018-02

Corrigendum to “A simple route to deposit SiO2 film with resistivity >109 Ω·μm” [Mater. Lett. 211 (2018) 277–280]

Dengyao Wang, Jindong Liu, Zhixuan Lv, Hualong Tao, Yunxian Cui, Hualin Wang, Shimin Liu, Chaoqian Liu, Nan Wang, Weiwei Jiang, Weiping Chai, Wanyu Ding

Materials Letters· Volume 213
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OpenAlex topics: Anodic Oxide Films and Nanostructures · Thin-Film Transistor Technologies · Semiconductor materials and devices

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