High-resolution, resistless patterning of indium-tin-oxide thin films using excimer laser projection annealing process

Abstract High-resolution, large-area patterning of indium-tin-oxide (ITO) thin film was demonstrated using an excimer laser projection crystallization process. After amorphous ITO (a-ITO) was deposited on a glass substrate, the a-ITO was selectively crystallized using an excimer laser scanning projection exposure system. Following the selective crystallization, the substrate was dipped in an etchant for an optimized time, resulting in formation of high-resolution patterns of polycrystalline ITO (p-ITO) on the substrate because the a-ITO has higher etch rate than the p-ITO. The p-ITO patterns were clean and sharp, and the pattern quality was suitable for production applications in the microelectronics industry.