journal article·2025

Designing pores to suppress crack generation at the interface between serpentine interconnects and elastomers for highly durable stretchable electronics

Seungkyu Lee, Jun Chang Yang, Steve Park

Materials Horizons· Volume 12· Issue 17
Publisher page

Abstract

Serpentine interconnects enable rigid materials to have high stretchability. They are considered to be very effective architectures to enable stretchable electronics. Therefore, research has primarily focused on exploring serpentine-based designs to enhance the stretchability of the interconnect itself. However, in practical applications, the interfacial cracks caused by repetitive stretching becomes a critical issue if serpentine interconnects are encapsulated within a polymer matrix. Here, we introduce geometrically engineered pores in a polymer matrix to suppress interfacial cracks under stretching. The serpentine interconnects with optimized pores in a polymer matrix improved mechanical stability (strain at failure, fatigue life) and electrical stability compared with those without pores. Furthermore, these strategies enabled the demonstration of a stretchable light-emitting diodes (LED) array and an electrical heater.
Source: openalex_inverted_index · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Advanced Sensor and Energy Harvesting Materials · Conducting polymers and applications · Electrospun Nanofibers in Biomedical Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 34141, Republic of Korea

Smart 3D Printing Research Team, Korea Electrotechnology Research Institute (KERI), Changwon, 51543, Republic of Korea

Funding

LG Display · National Research Foundation of Korea · National Research Council of Science and Technology

References (23)

Show source-provided references
1. Matsuhisa · Chem. Soc. Rev. · 2019 · 48 · 294610.1039/C8CS00814K ↗
2. Gao · Responsive Mater. · 2024 · 2 · e2023002210.1002/rpm.20230022 ↗
3. Park · Science · 2009 · 325 · 97710.1126/science.1175690 ↗
4. Park · ACS Appl. Mater. Interfaces · 2023 · 15 · 209210.1021/acsami.2c17653 ↗
5. Deng · npj Flexible Electron. · 2024 · 8 · 1210.1038/s41528-024-00298-z ↗
6. Li · ACS Nano · 2022 · 16 · 54110.1021/acsnano.1c07645 ↗
7. Corrigan · Commun. Mater. · 2023 · 4 · 3110.1038/s43246-023-00357-4 ↗
8. Park · Sci. Rep. · 2015 · 5 · 1235610.1038/srep12356 ↗
9. Yan · Adv. Mater. · 2023 · 35 · e221023810.1002/adma.202210238 ↗
10. Yang · Adv. Electron. Mater. · 2023 · 9 · 220133910.1002/aelm.202201339 ↗
11. Ji · J. Materiomics · 2020 · 6 · 33010.1016/j.jmat.2019.11.006 ↗
12. Koshi · Flexible Printed Electron. · 2024 · 9 · 01500910.1088/2058-8585/ad2778 ↗
13. Dong · ACS Appl. Electron. Mater. · 2023 · 5 · 465010.1021/acsaelm.3c00801 ↗
14. Li · Adv. Mater. · 2023 · 35 · e230034010.1002/adma.202300340 ↗
15. Jun Chang Yang · Sci. Adv. · 2022 · 8 · eabn386310.1126/sciadv.abn3863 ↗
16. Pan · Adv. Funct. Mater. · 2017 · 27 · 170258910.1002/adfm.201702589 ↗
17. Su · Adv. Mater. · 2017 · 29 · 160498910.1002/adma.201604989 ↗
18. Han · Nat. Electron. · 2019 · 2 · 2610.1038/s41928-018-0189-7 ↗
19. Fan · Nat. Commun. · 2014 · 5 · 326610.1038/ncomms4266 ↗
20. Xu · Nat. Commun. · 2013 · 4 · 154310.1038/ncomms2553 ↗
21. Jiao · Microsyst. Nanoeng. · 2023 · 9 · 14910.1038/s41378-023-00625-w ↗
22. Jang · Nat. Commun. · 2017 · 8 · 1589410.1038/ncomms15894 ↗
23. Shi · Adv. Mater. · 2024 · 36 · e231360310.1002/adma.202313603 ↗