journal article·2025-06-10

6-Bit Storage and Statistical Evolution of Quantum Conductance in a Ta2O5-Based Memristor Device

Prince Kumar, Suryanarayana Jammalamadaka

ACS Applied Electronic Materials· Volume 7· Issue 11
Publisher page

Abstract

We report on the evidenced conductance quantization and 6-bit memory states in the Ta 2 O 5 -based memristors. From the I – V characteristics, it is affirmed that the device exhibits stable bipolar resistive switching. During the reset process, the device shows quantization for the conductance in the multiple of integral and half-integral values of G 0 ∼ 7.74809 × 10 –5 S. X - ray photoelectron spectroscopy and conductive-atomic force microscopy confirm the conducting filament model through oxygen defects in Ta 2 O 5 -based memristor device. The existence of oxygen defect-mediated 1D conductive filaments is confirmed by determining the temperature coefficient of resistance (TCR) and is determined to be 5.28 × 10 –4 K –1 . The stability of the integral and half-integral quantized states is extracted from the relative standard deviation values (maximum RSD is 14% at 0.5 G 0 and the minimum is 0.91% at 10 G 0 ), obtained by Gaussian fitting of the conductance data. Upon varying the pulse amplitude, up to 68 (>2 6 ) memory states are evidenced, which demonstrates a 6 - bit memory. Despite the above, 36 (>2 5 ) quantized conductance ( G 0 ) states in the multiple of 0.5 G 0 are apparent from number of cycles vs. G/G 0 graph. These 32 quantum conductance and 6-bit memory states would indeed be helpful for future multibit data storage devices, neuromorphic applications, and in quantum information processing.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Magnetic Materials and Device Physics Laboratory, Department of Physics, Indian Institute of Technology Hyderabad, Kandi, Sangareddy, Hyderabad 502 284, India −

Funding

Indian Institute of Technology Hyderabad · Department of Science and Technology, Ministry of Science and Technology, India · Defence Research and Development Organisation · Ministry of Education, India

References (60)

Show source-provided references
1. 10.1016/j.nanoen.2023.10910610.1016/j.nanoen.2023.109106 ↗
2. 10.1021/nn501181t10.1021/nn501181t ↗
3. 10.1002/adma.20211027810.1002/adma.202110278 ↗
4. 10.1038/s41699-023-00427-810.1038/s41699-023-00427-8 ↗
5. 10.1038/nnano.2012.24010.1038/nnano.2012.240 ↗
6. 10.1038/s41928-017-0006-810.1038/s41928-017-0006-8 ↗
7. 10.1038/nature0693210.1038/nature06932 ↗
8. Yu, S.; Wu, Y.; Chai, Y.; Provine, J.; Wong, H.S. P. Characterization of Switching Parameters and Multilevel Capability in HfOx/AlOx Bi-Layer RRAM Devices. In Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications; IEEE, 2011; pp 1–2.10.1109/VTSA.2011.5872251 ↗
9. 10.1038/s41598-017-17785-110.1038/s41598-017-17785-1 ↗
10. 10.1016/S0039-6028(97)00601-810.1016/S0039-6028(97)00601-8 ↗
11. 10.1119/1.476533110.1119/1.4765331 ↗
12. 10.1038/s41467-018-03064-810.1038/s41467-018-03064-8 ↗
13. 10.1103/PhysRevB.101.11540110.1103/PhysRevB.101.115401 ↗
14. 10.1002/aelm.20190074410.1002/aelm.201900744 ↗
15. 10.1103/PhysRevB.73.19541110.1103/PhysRevB.73.195411 ↗
16. 10.1038/nnano.2016.5510.1038/nnano.2016.55 ↗
17. 10.1016/j.mtelec.2023.10006710.1016/j.mtelec.2023.100067 ↗
18. 10.1002/adma.20210962110.1002/adma.202109621 ↗
19. 10.1038/2739910.1038/27399 ↗
20. 10.1063/1.495387310.1063/1.4953873 ↗
21. 10.1186/s11671-020-03299-910.1186/s11671-020-03299-9 ↗
22. 10.1186/s11671-015-1118-610.1186/s11671-015-1118-6 ↗
23. 10.1063/1.472980510.1063/1.4729805 ↗
24. Datta S. · 1995
25. 10.1103/PhysRevB.39.804010.1103/PhysRevB.39.8040 ↗
26. 10.1063/1.473335610.1063/1.4733356 ↗
27. 10.1038/srep0270810.1038/srep02708 ↗
28. 10.1038/s41586-024-07902-210.1038/s41586-024-07902-2 ↗
29. 10.1007/s00339-019-2943-810.1007/s00339-019-2943-8 ↗
30. 10.1016/j.jeurceramsoc.2005.07.05410.1016/j.jeurceramsoc.2005.07.054 ↗
31. 10.1023/A:100897092263510.1023/A:1008970922635 ↗
32. 10.3390/ma1302034810.3390/ma13020348 ↗
33. 10.1038/srep2869210.1038/srep28692 ↗
34. 10.1021/cm063044110.1021/cm0630441 ↗
35. 10.1116/1.132365610.1116/1.1323656 ↗
36. 10.1038/srep3033510.1038/srep30335 ↗
37. 10.1063/1.479227410.1063/1.4792274 ↗
38. 10.1116/1.352564110.1116/1.3525641 ↗
39. 10.1103/PhysRev.58.81210.1103/PhysRev.58.812 ↗
40. 10.1098/rspa.1951.023110.1098/rspa.1951.0231 ↗
41. 10.1088/0022-3719/15/10/02910.1088/0022-3719/15/10/029 ↗
42. 10.1155/2014/57816810.1155/2014/578168 ↗
43. 10.1002/pssa.20230005010.1002/pssa.202300050 ↗
44. 10.1088/1361-6528/acc81110.1088/1361-6528/acc811 ↗
45. 10.1155/2021/556516910.1155/2021/5565169 ↗
46. 10.3938/jkps.51.66410.3938/jkps.51.664 ↗
47. 10.1088/1361-6528/ab932810.1088/1361-6528/ab9328 ↗
48. 10.1039/c3nr33692a10.1039/c3nr33692a ↗
49. 10.1109/LED.2011.216231110.1109/LED.2011.2162311 ↗
50. 10.1103/PhysRevB.74.03542610.1103/PhysRevB.74.035426 ↗
51. Multilevel Resistive and Magnetization Switching in Cu/CoFe2O4/Pt Device: Coexistence of Ionic and Metallic Conducting Filaments | Applied Physics Letters | AIP Publishing. https://pubs.aip.org/aip/apl/article/113/24/243501/36449/Multilevel-resistive-and-magnetization-switching (accessed 2024-05-11).
52. 10.1021/acsami.5b1178110.1021/acsami.5b11781 ↗
53. 10.1103/PhysRevB.48.1472110.1103/PhysRevB.48.14721 ↗
54. 10.1088/1742-6596/129/1/01202310.1088/1742-6596/129/1/012023 ↗
55. 10.1088/0953-8984/1/43/01110.1088/0953-8984/1/43/011 ↗
56. 10.1186/s11671-019-3229-y10.1186/s11671-019-3229-y ↗
57. 10.1002/inf2.1208510.1002/inf2.12085 ↗
58. 10.1186/s11671-022-03696-210.1186/s11671-022-03696-2 ↗
59. 10.1038/s41598-023-49924-210.1038/s41598-023-49924-2 ↗
60. 10.1002/adfm.20170043210.1002/adfm.201700432 ↗