Lithography with a Focused Soft X-ray Beam and a Monomolecular Resist
Source abstract
Abstract
A zone-plate-focused soft X-ray microbeam was utilized for direct patterning of a monomolecular resist: aliphatic and aromatic self-assembled monolayers. The fabricated patterns were subsequently imaged and characterized by a scanning photoelectron microscope (SPEM) using the same microbeam as the excitation source. The observed contrasts could be explained in terms of specific beam-resist interactions. The spatial resolution of the X-ray patterning was about 0.5 μm, which was mostly determined by the current SPEM settings and can be noticeably improved.
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Research context
OpenAlex topics: Advancements in Photolithography Techniques · Molecular Junctions and Nanostructures · Force Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, Hsinchu 300, Taiwan, Center for Condensed Matter Sciences, National Taiwan University, Taipei 106, Taiwan, Anorganische und Angewandte Chemie, Universität Hamburg, 20146 Hamburg, Germany, and Angewandte Physikalische Chemie, Universität Heidelberg, 69120 Heidelberg, Germany
References (22)
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