Atomic Force Microscopy-Based Nanolithography on Silicon Using Colloidal Au Nanoparticles As a Nanooxidation Mask

ADVERTISEMENT RETURN TO ISSUEPREVNoteNEXTAtomic Force Microscopy-Based Nanolithography on Silicon Using Colloidal Au Nanoparticles As a Nanooxidation MaskJiwen Zheng, Zhucheng Chen, and Zhongfan LiuView Author Information Center for Nanoscale Science & Technology (CNST), College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China Cite this: Langmuir 2000, 16, 24, 9673–9676Publication Date (Web):November 4, 2000Publication History Received22 May 2000Revised14 September 2000Published online4 November 2000Published inissue 1 November 2000https://pubs.acs.org/doi/10.1021/la000705ehttps://doi.org/10.1021/la000705ebrief-reportACS PublicationsCopyright © 2000 American Chemical SocietyRequest reuse permissionsArticle Views576Altmetric-Citations32LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail Other access optionsGet e-Alertsclose SUBJECTS:Etching,Metal nanoparticles,Nanoparticles,Oxidation,Silicon Get e-Alerts