Top-Down Approaches to the Formation of Silica Nanoparticle Patterns

This article reports a simple, versatile approach to the fabrication of lithographically defined mesoscopic colloidal silica nanoparticle patterns over large areas using spin-coating, interferometric lithography, and reactive-ion etching. One-dimensional nanoparticle films (bands) and 2D discs, diamonds, and holes with sub-micrometer periodicity, high quality, and excellent uniformity were successfully fabricated over large areas. The well-defined shape and period of the patterned nanoparticle film were controlled in the interferometric lithography step, while the thickness of nanoparticle film was easily tuned in the spin-coating step. This approach can extend to other deposition methods such as convective self-assembly, electrostatic self-assembly, and other materials such as metallic and ferromagnetic nanoparticles. We have also been able to generate sparse, random, isolated particle patterns, using a combination of interferometric lithography and layer-by-layer deposition as an extension of this approach to another deposition method, and to generate disc nanoparticle patterns using colloidal lithography as an extension of this approach to another lithography technique. These patterned films will find important applications in the fields of material growth, biosensors, and catalysis, as well as serving as building blocks for further fabrication.