Surface Engineering of Bromine-Based Plasma Polymer Films: A Step toward High Thiol Density Containing Organic Coatings

Nowadays, the development of synthetic methods regarding the fabrication of -SH containing organic coatings continues to attract a considerable attention. Among the potential techniques, the plasma polymerization appears as one of the most promising method but the difficulty to control the chemical composition of the layers is highly limiting. In this context, in this work, we report on an original method combining dry and wet chemistry approaches in view of selectively incorporating -SH functions in organic coatings. Our strategy is based on the (i) synthesis of a bromine-containing plasma polymer film, followed by (ii) a selective grafting of dithiol-based molecule on C-Br bond. Investigating the plasma polymerization process has revealed that, in our experimental window, the load of energy in the discharge has little influence on the chemical composition as well as on the cross-linking degree of the layers. This behavior is explained by considering the concomitant influence of the gas-phase reactions and the supply of energy to the growing film through ion bombardment. With regard to the functionalization strategy, based on comparative X-ray photoelectron spectroscopy measurements, it has been unambiguously demonstrated that a selective reaction between propanedithiol and the C-Br bond acting as the reactive center takes place resulting in the removing of the bromine atom and the incorporation of -SH groups in the PPF. Depending on the grafting reaction duration, the relative proportion of carbon bearing the -SH group is found to evolve from 4 to 6%. On the other hand, the dissolution of unbounded bromine-based species in the liquid medium during the grafting procedure is also evidenced. The whole set of our results clearly demonstrates the attractiveness of our strategy paving the way for new development in the fabrication of -SH-rich-containing organic thin films.