Thermoelectric Property of n-Type Bismuth-Doped SnSe Film: Influence of Characteristic Film Defect
Source abstract
Abstract
Highly aligned SnSe exhibits very high thermoelectric properties, and orientation control in films is very promising for developing high-performance thermoelectric modules. While SnSe films with intrinsic p-type nature have been reported, fabrication of the highly aligned n-type SnSe films is difficult due to thermodynamic restriction on the solubility of the doping elements. Here, highly oriented SnSe films doped with Bi were successfully fabricated using pulsed laser deposition. Characteristic film structures were observed: doped Bi in the SnSe matrix; domain boundaries with a spacing of ∼200 nm; self-organized Bi precipitates with a bimodal size distribution; and stacking faults. The most important result is observation of the n-type Hall resistivity and the n-type Seebeck coefficient. The stacking faults and the doped Bi in the films degraded the room-temperature Seebeck coefficient. While the electron carrier mobility in room temperature was smaller than that in the single crystal due to the domain boundary scattering, the domain boundary scattering was suppressed in the high temperature of 300 °C. Thus, the characteristic film structures significantly affect the thermoelectric properties of SnSe. The doped Bi in the SnSe matrix, the stacking faults, and the domain boundaries should be controlled for further improvement of the thermoelectric properties in the Bi-SnSe films, and the self-organized Bi nanoprecipitates are very promising for achieving high-performance Bi-SnSe with decreased thermal conductivity.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Thermoelectric Materials and Devices · Chalcogenide Semiconductor Thin Films · Heusler alloys: electronic and magnetic properties
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Science and Engineering, Kyushu Institute of Technology, 1-1 Sensui-cho, Tobata-ku, Kitakyushu 804-8550, Japan
Funding
TEPCO Memorial Foundation
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