Black Silicon Photoanodes Entirely Prepared with Abundant Materials by Low-Cost Wet Methods
Source abstract
Abstract
We report a new design for water-splitting photoanodes, based on a highly absorbing black silicon (BSi) substrate modified with catalytic metal nanoparticles (NPs). The overall fabrication strategy is cost-efficient as it only requires the use of abundant materials and simple wet procedures such as electrochemical etching and electrodeposition and does not involve the use of a buried homojunction and protection layer. Importantly, these results demonstrate that electrodeposited transition metal NPs can stabilize structured Si photoelectrodes without the need for a protection layer.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanowire Synthesis and Applications · Ga2O3 and related materials · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Univ Rennes, CNRS, ISCR (Institut des Sciences Chimiques de Rennes)-UMR6226 - ScanMAT-UMS2001, F-35000 Rennes, France
Synchrotron SOLEIL, L’Orme des Merisiers, Saint-Aubin 91192, Gif-sur-Yvette, France
Univ Rennes, CNRS, IPR (Institut de Physique de Rennes)-UMR 6251, F-35000 Rennes, France
Funding
Agence Nationale de la Recherche
References (28)
Show source-provided references
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