journal article·2023-12-25Open access

Role of Excess Bi on the Properties and Performance of BiFeO3 Thin-Film Photocathodes

Nitin P. Prasad, Marcus Rohnke, Marcel A. Verheijen, Jacobus M. Sturm, Jan P. Hofmann, Emiel J. M. Hensen, Anja Bieberle-Hütter

ACS Applied Energy Materials· Volume 6· Issue 24

Abstract

High Resolution Image Download MS PowerPoint Slide BiFeO 3 (BFO) has recently been identified as a promising photocathode material for photoelectrochemical (PEC) water splitting due to its light absorption and photoelectrochemical properties. The performance-limiting factors, in particular the impact of stoichiometry on the performance, still need to be understood. The effect of the ratio of Bi/Fe in the precursor solution for sol–gel synthesis on the properties and performance of BFO thin films is investigated in this study. Thin films with a stoichiometric Bi/Fe ratio and with a 10% excess of Bi are prepared on fluorine-doped tin-oxide substrates. While bulk characterization techniques show the formation of phase-pure BFO, surface characterization techniques indicate Bi enrichment on the surface. Light absorption and band gap do not change with excess Bi, whereas the current density is two times higher for Bi excess films compared to stoichiometric films at 0.6 V vs RHE. Electrochemical impedance spectroscopy attributes this improved performance of excess Bi thin films to a lower recombination rate and a lower charge transfer resistance. The lower recombination rate is attributed to fewer Bi and O vacancies, which can act as recombination centers. Therefore, adjusting the Bi/Fe ratio is an effective strategy to enhance the PEC performance of BFO photocathodes.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Multiferroics and related materials · Iron oxide chemistry and applications · Advanced Photocatalysis Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Laboratory of Inorganic Materials and Catalysis, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, Groene Loper 5, 5612 AE Eindhoven, The Netherlands

Electrochemical Materials and Interfaces (EMI), Dutch Institute for Fundamental Energy Research (DIFFER), De Zaale 20, 5612 AJ Eindhoven, The Netherlands

Institute for Physical Chemistry & Center for Materials Research, Justus Liebig University Gießen, 35392 Gießen, Germany

Plasma and Materials Processing (PMP), Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven, The Netherlands

Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522NB Enschede, The Netherlands

Surface Science Laboratory, Department of Materials and Earth Sciences, Technical University of Darmstadt, Otto-Berndt-Strasse 3, 64287 Darmstadt, Germany

Funding

Deutsche Forschungsgemeinschaft · Technische Universiteit Eindhoven · Dutch Institute for Fundamental Energy Research

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