journal article·2025-11-25

Engineering Tunable Electronic and Photocatalytic Properties in MoSSe/AlN Heterostructures

Mohamed Farkous, Jawad El Hamdaoui, Laura M. Pérez, Hassane Erguig, David Laroze, Aotmane En Naciri, Abdelouahad El Fatimy, El Mustapha Feddi

ACS Applied Electronic Materials· Volume 7· Issue 22
Publisher page

Abstract

We investigate MoSSe/AlN heterostructures using first-principles calculations to assess their structural stability, electronic properties, and photocatalytic potential for water splitting. Six stable stacking configurations are identified, all exhibiting indirect band gaps ranging from 0.56 to 1.20 eV (PBE) and 1.03 to 1.73 eV (HSE). Biaxial strain effectively tunes the band gap energies and can induce transitions from indirect to direct band gaps or even metallic states. Applying a perpendicular electric field further modulates the band gap, with bilayer structures showing initial band gap enlargement followed by a sharp decrease, while trilayers generally exhibit a monotonic decrease, leading to potential metallization. Unstrained AA, AB, A′A′A′, and AB′A configurations align favorably with water redox potentials, making them promising for photocatalytic water splitting. Our findings highlight the tunability of MoSSe/AlN heterostructures through stacking, strain, and electric fields, offering insights for designing advanced materials in nanoelectronics and renewable energy applications.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: 2D Materials and Applications · Heusler alloys: electronic and magnetic properties · MXene and MAX Phase Materials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Materials Physics and Subatomic Laboratory, Superior School of Technology

IBN-Tofail University

School of Applied and Engineering Physics, Mohammed VI Polytechnic University, Lot 660, Hay Moulay Rachid, Ben Guerir 43150, Morocco

Departamento de Ingeniería Industrial y de Sistemas, Universidad de Tarapacá, Casilla 7D, Arica 1000000, Chile

Instituto de Alta Investigación, Universidad de Tarapacá, Casilla 7 D, Arica 1000000, Chile

LCP-A2MC, ICPM, Université de Lorraine, 1 Bd Arago, Metz 57070, France

Funding

Fondo Nacional de Desarrollo Cient?fico y Tecnol?gico · Agencia Nacional de Investigaci?n y Desarrollo · BASAL

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