Composition-Dependent Functionality of Threshold Switching Behavior in Amorphous Ge–Te Binary System
Source abstract
Abstract
Amorphous chalcogenides, including Ge–Te binary system, exhibit distinct threshold switching behaviors essential for memory and selector applications. This study explores the threshold switching mechanisms in Te-rich Ge–Te compositions, systematically identifying key factors differentiating ovonic threshold switching (OTS) from phase change memory (PCM) functionality. Experimental results reveal that Te-rich compositions exhibit OTS behavior, characterized by reversible resistive switching at threshold voltages ranging from 1.2 to 1.6 V. In contrast, compositions near stoichiometric (GeTe) display PCM behavior, undergoing irreversible crystallization at a higher threshold voltage (∼5.0 V). Optical and electrical measurements correlate these behaviors with variations in band gap and trap depth. Our findings indicate that the difference in functionality is reflected in the relative position of the Fermi level with respect to the conduction band minimum: OTS materials exhibit deeper trap states, while PCM compositions have shallower trap states. This insight into the electronic structure provides a foundation for optimizing material properties to enhance the performance of next-generation memory and selector devices.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Phase-change materials and chalcogenides · Transition Metal Oxide Nanomaterials · Glass properties and applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Semiconductor Frontier Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba 305-8568, Japan
Research Institute for Advanced Electronics and Photonics, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 4, Higashi 1-1-1, Tsukuba 305-8568, Japan
Funding
ACT-X · Japan Society for the Promotion of Science · Iketani Science and Technology Foundation
References (35)
Show source-provided references
1. 10.1557/mrs.2019.20610.1557/mrs.2019.206 ↗
2. 10.1002/aelm.20240066510.1002/aelm.202400665 ↗
3. 10.1007/s40820-023-01289-x10.1007/s40820-023-01289-x ↗
4. Aikawa, H.; Song, J.; Nagase, T.; Seo, S.M.; Ito, Y.; Ha, T.J.; Yoshio, K.; Jung, B.K.; Oikawa, T.; Jung, K.Y.; Chae, S.J.; Kim, B.S.; Shin, M.C.; Kim, D.K.; Kim, T.H.; Hatsuda, K.; Hoya, K.; Kim, S.G.; Yi, J.Y.; Cha, S.Y. In Reliable Memory Operation with Low Read Disturb Rate in the World Smallest 1Selector-1MTJ Cell for 64 Gb Cross-Point MRAM 2024 IEEE International Electron Devices Meeting; IEEE, 2024, pp 1–4.10.1109/IEDM50854.2024.10873384 ↗
5. 10.1038/nmat200910.1038/nmat2009 ↗
6. 10.1002/advs.20240802810.1002/advs.202408028 ↗
7. Kim, M.; Bae, Y.; Park, J.; Yeon, J.; Shim, H.; Jin, S.; Kim, H.; Oh, S.; Do, G.; Yun, D.; Lee, H.D.; Ahn, D.; Lee, J.; Park, M.; Yoon, J.; Yi, J.; Kim, T.; Park, G.; Chung, S.; Cheon, J.; Chae, S.; Park, N.; Kim, K.; Oh, D.; Yi, J.; Cha, S. In First Demonstration of Fully Integrated 16 nm Half-Pitch Selector Only Memory (SOM) for Emerging CXL Memory , 2024 IEEE Symposium on VLSI and Circuits; IEEE, 2024, pp 1–2.10.1109/VLSITechnologyandCir46783.2024.10631351 ↗
8. Fantini, P.; Ghetti, A.; Varesi, E.; Pirovano, A.; Baratella, D.; Ribaldone, C.; Campi, D.; Bernasconi, M.; Bez, R. In VT Window Model of the Single-Chalcogenide Xpoint Memory (SXM) , 2024 IEEE International Electron Devices Meeting; IEEE, 2024, pp 1–4.10.1109/IEDM50854.2024.10873337 ↗
9. Park, I.M.; Lee, K. W.; Park, J.H.; Song, S. J.; Kim, T. Y.; Wu, Z.; Lee, W. J.; Choi, B. D.; Jeong, Y. J.; Oh, S. C.; Park, K.; Kuh, B. J.; Song, Y. J.; Shin, Y. G.; Song, J. H. In Enhanced Endurance Characteristics in High Performance 16nm Selector Only Memory (SOM) , 2023 International Electron Devices Meeting; IEEE, 2023, pp 1–4.10.1109/IEDM45741.2023.10413748 ↗
10. Lee, J.; Seo, Y.; Ban, S.; Kim, D.; Heo, S.; Kang, D.; Hwang, H. In Enhancing Se-based Selector-only Memory with Ultra-fast Write Speed (∼10 ns) and Superior Retention Characteristics (> 10 years at RT) via Material Design and UV Treatment Engineering , 2023 International Electron Devices Meeting; IEEE, 2023, pp 1–4.10.1109/IEDM45741.2023.10413815 ↗
11. Pellizzer, F.; Pirovano, A.; Bez, R.; Meyer, R. L. In Status and Perspectives of Chalcogenide-based CrossPoint Memories , 2023 International Electron Devices Meeting; IEEE, 2023, pp 1–4.10.1109/IEDM45741.2023.10413669 ↗
12. 10.1063/1.273713710.1063/1.2737137 ↗
13. 10.1063/1.478879810.1063/1.4788798 ↗
14. 10.1002/aelm.20230003710.1002/aelm.202300037 ↗
15. 10.1002/advs.20240403510.1002/advs.202404035 ↗
16. 10.1063/1.370074310.1063/1.3700743 ↗
17. 10.1016/j.actamat.2023.11920910.1016/j.actamat.2023.119209 ↗
18. Ban, S.; Lee, J.; Kim, T.; Hwang, H. In Simple Binary In-Te OTS with Sub-nm HfO Buffer Layer for 3D Vertical X-point Memory Applications , IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits); IEEE, 2023.10.23919/VLSITechnologyandCir57934.2023.10185213 ↗
19. 10.1063/1.319167010.1063/1.3191670 ↗
20. 10.1016/j.sse.2017.06.00410.1016/j.sse.2017.06.004 ↗
21. 10.1016/j.mssp.2021.10599910.1016/j.mssp.2021.105999 ↗
22. 10.1002/adma.20100474610.1002/adma.201004746 ↗
23. 10.1016/j.sse.2013.07.00510.1016/j.sse.2013.07.005 ↗
24. 10.1002/adfm.20242394010.1002/adfm.202423940 ↗
25. 10.1002/pssb.1966015022410.1002/pssb.19660150224 ↗
26. 10.1063/1.165731810.1063/1.1657318 ↗
27. 10.1016/j.vacuum.2021.11084710.1016/j.vacuum.2021.110847 ↗
28. 10.1039/D4TC03146F10.1039/D4TC03146F ↗
29. 10.1109/TED.2003.82324310.1109/TED.2003.823243 ↗
30. 10.1038/srep1369810.1038/srep13698 ↗
31. 10.1021/acsaelm.5c0029210.1021/acsaelm.5c00292 ↗
32. 10.1103/PhysRevB.93.11520110.1103/PhysRevB.93.115201 ↗
33. 10.1063/1.513899810.1063/1.5138998 ↗
34. 10.1002/inf2.1231510.1002/inf2.12315 ↗
35. 10.1002/adfm.20230492610.1002/adfm.202304926 ↗