Effects of thermal annealing of thin Au film on Fe40Ni38Mo4B18 in ultrahigh vacuum (UHV)
Source abstract
Abstract
Thin films (∼20 nm) of Au were vapour-deposited on melt-spun amorphous ribbon specimens of the alloy Fe40Ni38Mo4B18 at room temperature. The specimens were subsequently annealed in UHV (∼10−8 mbar) at 723 and 823 K in order to observe any dispersion of Au as nanoparticles in the alloy matrix. The motivation for these investigations was derived from similar experiments carried out earlier in nitrogen and in low vacuum conditions, wherein a model based on segregation and oxidation of matrix elements was proposed in order to explain the observed dispersion of Au in the alloy matrix. The present investigations in UHV were carried out as a critical test of this model. However, XPS investigations carried out on these specimens in UHV did not show any dispersion of Au particles after annealing at these temperatures. Further examination of annealed specimen surfaces by SEM and AFM revealed the formation of Au-rich islands on the surface. Native oxide film underneath the Au film and crystallization of the alloy during thermal annealing do not seem to have any effect on depth profiles of Au. These results, when compared with those obtained after annealing the specimens in nitrogen and in low vacuum conditions (∼10−1–10−3 mbar), are suggestive of the crucial role of the annealing atmosphere during thermal annealing.
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Research context
OpenAlex topics: Metallic Glasses and Amorphous Alloys · Metallurgical and Alloy Processes · Magnetic Properties of Alloys
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (18)
Show source-provided references
1. J. M. Poate, K. N. Tu and J. W. Mayer, "Thin Films: Interdiffusion and Reactions" (Wiley, NY, 1978).
2. T. Noguch, K. Gotoh, Y. Yamaguch and S. Deki, J. Mater. Sci. Lett. 10(1991) 648.
3. K. Akamatsu and S. Deki, J. Coll. Interf. Sci. 214(1999) 353.10.1006/jcis.1999.6191 ↗
4. S. Deki, K. Sayo, T. Fujita, A. Yamada and S. Hayashi, J. Mater. Chem. 9(1999) 943. 629610.1039/a900012g ↗
5. T. Yano, "Solid Phase Dispersion Through Thermal Relaxation Process," Master Thesis, Division of Industrial Chemistry, Graduate School of Engineering, Kobe University Japan, Thesis No. 920T219T, 1999.
6. S. Deki, "Division of Industrial Chemistry," Graduate School of Engineering, Kobe University, Japan 2001 (private communication).
7. S. K. Sharma, V. Zaporojtchenko, J. Zekonyte, S. Deki and F. Faupel, Mater. Sci. Engng. A 351(1/2) (2003) 316.10.1016/S0921-5093(02)00838-9 ↗
8. Y. Watanabe, Y. Nakamura, S. Hirayama and N. Taniguchi , J. Vac. Sci. Technol. B 13(1995) 1207.10.1116/1.588237 ↗
9. J. F. Moulder, W. F. Stickle, P. E. Sobol and K. D. Bomben, "Handbook of X-ray Photoelectron Spectroscopy" (Perkin Elmer Corporation, Physical Electronics Division, Minnesota, USA, 1992).
10. E. A. Brandes and G. B. Brook (eds.), "Smithells Metals Reference Book" (Butterworth Heinmann, Oxford, 1998).
11. F. R. De Boer, R. Boom, W. C. M. Mattens, A. R. Miedema and A. K. Niessen, "Cohesion in Metals, Transition Metal Alloys" (North Holland, Amsterdam, 1988).
12. Y. Zhang, U. Czubayko, N. Wanderka, F. Zhu, and H. Wollenberger, J. Mater. Res. 15(2000) 1271.10.1557/JMR.2000.0185 ↗
13. D. Akhtar, B. Cantor and R. W. Cahn, Acta Metall. 30(1982) 1571.10.1016/0001-6160(82)90177-8 ↗
14. S. K. Sharma, S. Banerjee, Kuldeep and A. K. Jain, ibid. 36(1988) 1683.10.1016/0001-6160(88)90235-0 ↗
15. S. Lenser, V. Zoellmer, J. Erichsen, S. Daniel, K. Raetzke, S. Deki and F. Faupel, Scripta Materialia. 48(2003) 275.10.1016/S1359-6462(02)00384-6 ↗
16. D. Qiao, L. S. Yu, S. S. Lau, L. Y. Lin, H. S. Jiang and T. E. Haynes, J. Appl. Phys. 88(2000) 4196.10.1063/1.1311809 ↗
17. L. Chen, F. R. Chen, J. J. Kai, L. Chang, J. K. Ho, C. S. Jong, C. C. Chiu, C. N. Huang, C. Y. Chen and K. K. Shih, ibid. 86(1999) 3826.10.1063/1.371294 ↗
18. J. K. Sheu, Y. K. Su, G. C. Chi, W. C. Chen, C. Y. Chen, C. N. Huang, J. M. Hong, Y. C. Yu, W. Wang and E. K. Lin, ibid. 83(1998) 3172.10.1063/1.367084 ↗