Silicon microstructures through the production of silicon nanowires by metal-assisted chemical etching, used as sacrificial material
Source abstract
Abstract
A simple, inexpensive and wafer-scale method to obtain Si microstructures is proposed. The method consists in a sequence of steps that include a selective metal-assisted chemical etching process to create regions of Si nanowires that are sacrificed in a post-etching process, leaving microstructures standing. As a proof of concept, Si micropillars with length of 7 µm and diameter of 1.4 µm were fabricated. The advantage of the proposed method is its simplicity, allowing the production of microstructures in a basic chemical laboratory.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nanowire Synthesis and Applications · Silicon Nanostructures and Photoluminescence · Anodic Oxide Films and Nanostructures
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (43)
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