Influence of argon pressure on the composition of Co-early transition metal films fabricated by r.f. magnetron sputtering in the composite target mode

journal article·1993-06

S. H. Han, H. J. Kim, I. K. Kang, J. J. Lee

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OpenAlex topics: Metal and Thin Film Mechanics · Copper Interconnects and Reliability · Surface and Thin Film Phenomena

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3. S. Hayakawa and K. Wasa, “Thin Film Technology” (in Japanese) (Kyoritsu, Tokyo, 1982) p. 124.

4. H. Yamamoto, “Manufacturing Technology of Magnetic Films” (in Japanese) (Tricaps, Tokyo, 1984) p. 2.

5. N. Laegreid and G. K. Wehner, J. Appl. Phys. 32 (1961) 365.10.1063/1.1736012 ↗

6. K. Ouchi, PhD thesis, Tohoku University (1988).