A new etchant system, K2Cr2O7-H2SO4-HCl, for GaAs and InP
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OpenAlex topics: Optical Coatings and Gratings · Semiconductor materials and devices · 3D IC and TSV technologies
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References (10)
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1. W. Kern,RCA Rev. 39 (1978) 227.
2. H. C. Gatos andM. C. Lavin,J. Electrochem. Soc. 107 (1960) 427.10.1149/1.2427712 ↗
3. B. Tuck andA. J. Baker,J. Mater. Sci. 8 (1973) 1559.10.1007/BF00754890 ↗
4. T. Kambayashi, C. Kitahara andK. Iga,Japan J. Appl. Phys. 19 (1980) 79.10.1143/JJAP.19.79 ↗
5. S. Adachi andH. Kawaguchi,J. Electrochem. Soc. 128 (1981).10.1149/1.2127633 ↗
6. Y. Tarui, Y. Komiya andY. Harada,ibid. 118 (1971) 118.10.1149/1.2407921 ↗
7. H. C. Gatos andM. C. Lavin,ibid. 107 (1960) 433.10.1149/1.2427713 ↗
8. H. L. Merz, R. A. Logan andA. M. Sergent,IEEE J. Quantum Electron. QE-15 (1979) 72.10.1109/JQE.1979.1069972 ↗
9. K. Iga, T. Kambayashi, K. Wakao, K. Moriki andC. Kitahara,ibid. QE-15 (1979) 707.10.1109/JQE.1979.1070100 ↗
10. T. Tsukada, R. Ito, H. Nakashima andO. Nakada,ibid. QE-7 (1973) 356.10.1109/JQE.1973.1077466 ↗