First principles study of the adhesion asymmetry of a metal/oxide interface
Source abstract
Abstract
The observed asymmetry in the interfacial adhesion between ZnO and Ag is studied using a first principles density functional approach. The interface formed when ZnO is deposited on Ag (111) is experimentally measured to be stronger than that formed when Ag is deposited on ZnO (0001) and this indicates a possible difference in bonding geometries. It is found that because the ZnO (0001) surface does not exhibit atoms which are onefold coordinated with the sub-surface layer this restricts the way Ag can bond to the surface whereas no such restriction exists, when ZnO is deposited on the Ag (111) surface. The study focuses on a particular Ag (111)/ZnO (0001) interface which has rotated epitaxy and by calculating the ideal work of separation it is found that an O-terminated interface which is onefold coordinated with an adjacent Zn layer is significantly stronger than the corresponding interface which is threefold coordinated with an adjacent Zn layer. This is consistent with the observations, since the onefold coordinated interface cannot form when Ag is deposited on to ZnO (0001). Additional calculations indicate that the stronger onefold coordinated interface can also separate leaving oxygen on the Ag surface provided that surface relaxation effects are suppressed.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: ZnO doping and properties · Electronic and Structural Properties of Oxides · Gas Sensing Nanomaterials and Sensors
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (23)
Show source-provided references
1. Glaser HJ (2000) Large area glass coating. Von Ardenne Anlagentechnik, Gmbh, Dresden
2. Hummel RE, Guenther KH (eds) (1995) Handbook of optical properties: thin films for optical coatings, vol 1. CRC, Boca Raton
3. Ridealgh JA (2006) Mat Res Soc Proc 890:39
4. Barthel E, Kerjan O, Nael P, Nadaud N (2005) Thin Solid Films 473:27210.1016/j.tsf.2004.08.017 ↗
5. Lin Z, Bristowe PD (2007) Phys Rev B 75:20542310.1103/PhysRevB.75.205423 ↗
6. Arbab M (2001) Thin Solid Films 381:1510.1016/S0040-6090(00)01341-9 ↗
7. Wander A, Schedin F, Steadman P, Norris A, McGrath R, Turner TS, Thornton G, Harrison NM (2001) Phys Rev Lett 86:381110.1103/PhysRevLett.86.3811 ↗
8. Meyer B, Marx D (2003) Phys Rev B 67:03540310.1103/PhysRevB.67.035403 ↗
9. Meyer B (2004) Phys Rev B 69:04541610.1103/PhysRevB.69.045416 ↗
10. Kunat M, Gil Girol St, Becker Th, Burghaus U, Woll Ch (2002) Phys Rev B 66:08140210.1103/PhysRevB.66.081402 ↗
11. Kresse G, Dulub O, Diebold U (2003) Phys Rev B 68:24540910.1103/PhysRevB.68.245409 ↗
12. Matthews JW, Blakeslee AE (1974) J Cryst Growth 27:118
13. Culbertson RJ, Feldman LC, Silverman PJ, Boehm H (1981) Phys Rev Lett 47:65710.1103/PhysRevLett.47.657 ↗
14. de Leeuw NH, Nelson CJ (2003) J Phys Chem B 107:352810.1021/jp027001t ↗
15. Payne MC, Teter MP, Allan DC, Arias TA, Joannopoulos JD (1992) Rev Mod Phys 64:104510.1103/RevModPhys.64.1045 ↗
16. Clark SJ, Segall MD, Pickard CJ, Hasnip PJ, Probert MJ, Refson K, Payne MC (2005) Z Kristallogr 220:56710.1524/zkri.220.5.567.65075 ↗
17. Vanderbilt D (1990) Phys Rev B 41:789210.1103/PhysRevB.41.7892 ↗
18. Perdew JP, Burke K, Ernzerhof M (1996) Phys Rev Lett 77:386510.1103/PhysRevLett.77.3865 ↗
19. Fischer TH, Almlof J (1992) J Phys Chem 96:976810.1021/j100203a036 ↗
20. Tarnow E, Dallot P, Bristowe PD, Joannopoulos JD, Francis GP, Payne MC (1990) Phys Rev B 42:364410.1103/PhysRevB.42.3644 ↗
21. Meyer B, Marx D (2004) Phys Rev B 69:23542010.1103/PhysRevB.69.235420 ↗
22. Finnis MW (1996) J Phys: Condens Matter 8:5811
23. Li WX, Stampfl C, Scheffler M (2002) Phys Rev B 65:07540710.1103/PhysRevB.65.075407 ↗