Self-Sustained Quasi-1D Silicon Nanostructures for Thermoelectric Applications
Source abstract
Abstract
High Resolution Image Download MS PowerPoint Slide Silicon (Si) nanowires have garnered significant interest for their potential applications in Si-based thermoelectrics, primarily due to their low thermal conductivity. While there are several methods to obtain Si nanowires, their density has been a limiting factor, resulting in a low power density that can be achieved by thermoelectric generators. To address this limitation, metal-assisted chemical etching (MACE) has been developed, enabling the creation of high-density nanopillar “forests”. This technique overcomes the previous density constraints. However, Si nanopillars protrude from a bulk Si wafer, which adds its thermal and electric resistivity to those of nanopillars, ultimately reducing the overall power density that can be attained. In this paper, we demonstrate how precise control of pre- and post-MACE processing allows for the creation of fully self-sustained quasi-1D Si nanostructures. We additionally demonstrate that pre-MACE Si processing does not control nanopillar bundling; rather, it primarily determines their shape. This outcome is attributed to the formation of gas nanobubbles during the initial steps of MACE.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanowire Synthesis and Applications · Advanced Thermoelectric Materials and Devices · Molecular Junctions and Nanostructures
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Science, University of Milano−Bicocca, I-20125 Milan, Italy
Funding
Ministero dell'Universit? e della Ricerca
References (39)
Show source-provided references
1. 10.1038/nature0638110.1038/nature06381 ↗
2. 10.1038/nature0645810.1038/nature06458 ↗
3. 10.3390/ma1503121410.3390/ma15031214 ↗
4. 10.1103/PhysRev.134.A105810.1103/PhysRev.134.A1058 ↗
5. 10.1021/acs.nanolett.8b0382210.1021/acs.nanolett.8b03822 ↗
6. 10.1063/1.12399410.1063/1.123994 ↗
7. 10.1021/cr900141g10.1021/cr900141g ↗
8. 10.1002/adma.20100178410.1002/adma.201001784 ↗
9. 10.1088/1361-6528/aae5b610.1088/1361-6528/aae5b6 ↗
10. 10.1016/j.electacta.2012.12.07510.1016/j.electacta.2012.12.075 ↗
11. 10.1088/0957-4484/25/17/17560110.1088/0957-4484/25/17/175601 ↗
12. 10.1088/1361-6528/ab9b4710.1088/1361-6528/ab9b47 ↗
13. 10.1088/1361-6528/acb32010.1088/1361-6528/acb320 ↗
14. 10.1109/TSM.2022.319063010.1109/TSM.2022.3190630 ↗
15. 10.1016/j.snb.2004.08.01610.1016/j.snb.2004.08.016 ↗
16. 10.1021/acsomega.1c0021010.1021/acsomega.1c00210 ↗
17. Linevych, Y.; Koval, V.; Dusheiko, M.; Yakymenko, Y.; Lakyda, M.; Barbash, V. Silicon Diode Structures Based on Nanowires for Temperature Sensing Application. 2022 IEEE 41st International Conference on Electronics and Nanotechnology (ELNANO); IEEE, 2022; pp 190–195.10.1109/ELNANO54667.2022.9927122 ↗
18. 10.1007/s11665-018-3605-210.1007/s11665-018-3605-2 ↗
19. 10.1016/j.mattod.2023.04.02110.1016/j.mattod.2023.04.021 ↗
20. 10.1021/la501768f10.1021/la501768f ↗
21. Guo Z. · SPIE Proc. · 2010 · 77721C10.1117/12.860397 ↗
22. 10.1002/adem.20170089310.1002/adem.201700893 ↗
23. 10.1063/1.218373510.1063/1.2183735 ↗
24. 10.1021/acs.nanolett.0c0253910.1021/acs.nanolett.0c02539 ↗
25. 10.1149/1.358350910.1149/1.3583509 ↗
26. 10.3365/eml.2010.06.05910.3365/eml.2010.06.059 ↗
27. 10.1088/0957-4484/27/45/45530210.1088/0957-4484/27/45/455302 ↗
28. 10.1039/c2jm30619k10.1039/c2jm30619k ↗
29. Hull, R. Properties of Crystalline Silicon; Institution of Electrical Engineers, 1999; p 1042.
30. 10.1088/1361-6439/aa96c410.1088/1361-6439/aa96c4 ↗
31. Bockris, J. O.; Reddy, A. K. N.; Gamboa-Adelco, M. Modern Electrochemistry 2A; Springer, 2001; p 815.
32. 10.1147/rd.433.035110.1147/rd.433.0351 ↗
33. 10.1016/j.apsusc.2010.08.08610.1016/j.apsusc.2010.08.086 ↗
34. 10.1109/84.54640610.1109/84.546406 ↗
35. 10.1063/1.34718110.1063/1.347181 ↗
36. 10.1103/RevModPhys.87.98110.1103/RevModPhys.87.981 ↗
37. 10.1021/la303837c10.1021/la303837c ↗
38. 10.1016/j.scriptamat.2015.11.01410.1016/j.scriptamat.2015.11.014 ↗
39. 10.1021/acs.nanolett.0c0022710.1021/acs.nanolett.0c00227 ↗