journal article·2023-12-26

Engineered Vertically Stacked NSFET Charge-Trapping Synapse for Neuromorphic Applications

Md. Hasan Raza Ansari, Nupur Navlakha, Nazek El-Atab

ACS Applied Electronic Materials· Volume 5· Issue 12
Publisher page

Abstract

In this work, a vertically stacked nanosheet FET (NSFET) is engineered for neuromorphic applications, which consists of nonidentical sheets in the vertical direction. The proposed NSFET has three nanosheets: two with embedded charge-trapping layers and one without a trap layer. This helps enhance the electric field along the channel direction of the device and thus the conductance of an electronic synaptic device. The estimated conductance values from the vertical nanosheet FET are used as a weight in the convolutional neural network (CNN) algorithm for image classification for the Canadian Institute for Advanced Research (CIFAR)-10 dataset. Results show improved performance in terms of nonlinearity, accuracy, and a higher conductance value compared to the conventional NSFET (identical sheets with a charge-trapping layer). Moreover, the engineered NSFET device has a high density and achieves ∼88.8% accuracy for image classification, which makes it a promising candidate for next-generation neuromorphic computing.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Ferroelectric and Negative Capacitance Devices · Semiconductor materials and devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Electrical and Computer Engineering, Computer, Electrical and Mathematical Science and Engineering (CEMSE) Division, King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia

Microelectronics Research Center, Electrical and Computer Engineering, The University of Texas at Austin, Austin, Texas78758, United States

Funding

King Abdullah University of Science and Technology

References (32)

Show source-provided references
1. Jerry, M.; Chen, P.Y.; Zhang, J.; Sharma, P.; Ni, K.; Yu, S.; Datta, S. In Ferroelectric FET Analog Synapse for Acceleration of Deep Neural Network Training, 2017 IEEE International Electron Devices Meeting (IEDM); IEEE, 2017; Vol. 6, pp 6.2.1–6.2.4.10.1109/IEDM.2017.8268338 ↗
2. 10.1088/1361-6528/ab554b10.1088/1361-6528/ab554b ↗
3. 10.1038/s43588-021-00184-y10.1038/s43588-021-00184-y ↗
4. 10.1063/5.007352810.1063/5.0073528 ↗
5. 10.1038/s41565-020-0655-z10.1038/s41565-020-0655-z ↗
6. 10.1109/TED.2023.323767010.1109/TED.2023.3237670 ↗
7. 10.1021/acs.nanolett.1c0316910.1021/acs.nanolett.1c03169 ↗
8. 10.1002/aelm.20220115510.1002/aelm.202201155 ↗
9. 10.1021/acs.nanolett.1c0049210.1021/acs.nanolett.1c00492 ↗
10. 10.1109/TED.2022.323329210.1109/TED.2022.3233292 ↗
11. 10.1109/TCAD.2020.304373110.1109/TCAD.2020.3043731 ↗
12. 10.1039/C8FD00127H10.1039/C8FD00127H ↗
13. Suri, M.; Bichler, O.; Querlioz, D.; Cueto, O.; Perniola, L.; Sousa, V.; Vuillaume, D.; Gamrat, C.; DeSalvo, B. In Phase Change Memory as Synapse for Ultra-Dense Neuromorphic Systems: Application to Complex Visual Pattern Extraction, 2011 International Electron Devices Meeting, IEEE, 2011; pp 4.4.1–4.4.4.10.1109/IEDM.2011.6131488 ↗
14. 10.3389/fnins.2016.0005610.3389/fnins.2016.00056 ↗
15. He, Z.; Angizi, S.; Fan, D. In Accelerating Low Bit-Width Deep Convolution Neural Network in MRAM, Computer Society Annual Symposium on VLSI (ISVLSI), IEEE, 2018, Vol. 2018-July, pp 533–538.10.1109/ISVLSI.2018.00103 ↗
16. 10.1109/TED.2022.320713010.1109/TED.2022.3207130 ↗
17. 10.1109/TED.2023.323401810.1109/TED.2023.3234018 ↗
18. 10.1109/LED.2019.292833510.1109/LED.2019.2928335 ↗
19. 10.1109/JEDS.2021.311134310.1109/JEDS.2021.3111343 ↗
20. Loubet, N.; Hook, T.; Montanini, P.; Yeung, C.W.; Kanakasabapathy, S.; Guillom, M.; Yamashita, T.; Zhang, J.; Miao, X.; Wang, J.; Young, A.; Chao, R.; Kang, M.; Liu, Z.; Fan, S.; Hamieh, B.; Sieg, S.; Mignot, Y.; Xu, W.; Seo, S.C.; Yoo, J.; Mochizuki, S.; Sankarapandian, M.; Kwon, O.; Carr, A.; Greene, A.; Park, Y.; Frougier, J.; Galatage, R.; Bao, R.; Shearer, J.; Conti, R.; Song, H.; Lee, D.; Kong, D.; Xu, Y.; Arceo, A.; Bi, Z.; Xu, P.; Muthinti, R.; Li, J.; Wong, R.; Brown, D.; Oldiges, P.; Robison, R.; Arnold, J.; Felix, N.; Skordas, S.; Gaudiello, J.; Standaert, T.; Jagannathan, H.; Corliss, D.; Na, M.H.; Knorr, A.; Wu, T.; Gupta, D.; Lian, S.; Divakaruni, R.; Gow, T.; Labelle, C.; Lee, S.; Paruchuri, V.; Bu, H.; Khare, M. In Stacked Nanosheet Gate-All-around Transistor to Enable Scaling beyond FinFET, 2017 Symposium on VLSI Technology, IEEE, 2017, Vol. 5, pp T230–T231.10.23919/VLSIT.2017.7998183 ↗
21. 10.1109/LED.2008.92026710.1109/LED.2008.920267 ↗
22. 10.1016/j.sse.2010.04.02610.1016/j.sse.2010.04.026 ↗
23. Chang, S.W.; Li, J.H.; Huang, M.K.; Huang, Y.C.; Huang, S.T.; Wang, H.C.; Huang, Y.J.; Wang, J.Y.; Yu, L.W.; Huang, Y.F.; Hsueh, F.K.; Sung, P.J.; Wu, C.T.; Ma, W. C. Y.; Kao, K.H.; Lee, Y.J.; Lin, C.L.; Chuang, R. W.; Huang, K.P.; Samukawa, S.; Li, Y.; Lee, W.H.; Chu, T.Y.; Chao, T.S.; Huang, G.W.; Wu, W.F.; Li, J.Y.; Shieh, J.M.; Yeh, W.K.; Wang, Y.H.; Lu, D. D.; Wang, C.J.; Lin, N.C.; Su, C.J.; Lo, S.H.; Huang, H.F. In First Demonstration of CMOS Inverter and 6T-SRAM Based on GAA CFETs Structure for 3D-IC Applications, 2019 IEEE International Electron Devices Meeting (IEDM), IEEE, 2019, Vol. 2019-Dec, pp 11.7.1–11.7.4.10.1109/IEDM19573.2019.8993525 ↗
24. Subramanian, S.; Hosseini, M.; Chiarella, T.; Sarkar, S.; Schuddinck, P.; Chan, B. T.; Radisic, D.; Mannaert, G.; Hikavyy, A.; Rosseel, E.; Sebaai, F.; Peter, A.; Hopf, T.; Morin, P.; Wang, S.; Devriendt, K.; Batuk, D.; Martinez, G. T.; Veloso, A.; Litta, E. D.; Baudot, S.; Siew, Y. K.; Zhou, X.; Briggs, B.; Capogreco, E.; Hung, J.; Koret, R.; Spessot, A.; Ryckaert, J.; Demuynck, S.; Horiguchi, N.; Boemmels, J. In First Monolithic Integration of 3D Complementary FET (CFET) on 300 mm Wafers, 2020 IEEE Symposium on VLSI Technology, IEEE, 2020, Vol. 2020-June, pp 1–2.10.1109/VLSITechnology18217.2020.9265073 ↗
25. Mochizuki, S.; Bhuiyan, M.; Zhou, H.; Zhang, J.; Stuckert, E.; Li, J.; Zhao, K.; Wang, M.; Basker, V.; Loubet, N.; Guo, D.; Haran, B.; Bu, H. In Stacked Gate-All-Around Nanosheet PFET with Highly Compressive Strained Si 1-x Ge x Channel, 2020 IEEE International Electron Devices Meeting (IEDM), IEEE, 2020, Vol. 2020-Dec, pp 2.3.1–2.3.4.10.1109/IEDM13553.2020.9372041 ↗
26. 10.1109/TED.2023.323839310.1109/TED.2023.3238393 ↗
27. Synopsys. Sentaurus TCAD Datasheet. 2018.
28. 10.1109/TED.2019.295158210.1109/TED.2019.2951582 ↗
29. 10.1021/acsnano.7b0334710.1021/acsnano.7b03347 ↗
30. 10.3389/frai.2021.65906010.3389/frai.2021.659060 ↗
31. 10.1021/acsami.3c0025410.1021/acsami.3c00254 ↗
32. 10.1038/s41598-019-55310-810.1038/s41598-019-55310-8 ↗