Large Sign Reversal of Tunneling Magnetoresistance in an Epitaxial Fe/MgAlOx/Fe4N Magnetic Tunnel Junction
Source abstract
Abstract
A sign-reversible tunneling magnetoresistance (TMR) bestows an extra control freedom to design TMR-based spintronic devices for developing spin-logic applications. Here, we demonstrate a large sign reversal of TMR in an epitaxial Fe/MgAlO x /Fe 4 N magnetic tunnel junction (MTJ) controlled by the bias voltage. At room temperature (RT), the TMR is measured as large as −26.7% (−38% under optimistic definition) at V = +0.45 V, and it changes the sign to be +3.2% at V = −0.6 V. The TMR sign-reversal effect is doubled compared to those of the Fe/MgO/Fe 4 N MTJs, which is attributed to the better lattice mismatch between Fe 4 N and MgAlO x as well as less N diffusion inside the tunneling barrier. First-principles calculations reveal that the change of the TMR sign originates from different symmetry-dependent tunneling channels between Fe and Fe 4 N electrodes under opposite bias voltages. The Fe/MgAlO x /Fe 4 N MTJ with voltage-controllable TMR signs and relatively large TMR ratios at RT will promote the development of versatile and reprogrammable spin-logic applications.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Magnetic properties of thin films · Semiconductor materials and devices · Ferroelectric and Negative Capacitance Devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, University of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing 100190, China
Institut Jean Lamour, Université de Lorraine, CNRS, UMR 7198, Nancy 54011, France
Key Laboratory of Physics and Technology for Advanced Batteries, Department of Physics, Jilin University, Changchun 130012, China
Funding
Agence Nationale de la Recherche
References (50)
Show source-provided references
1. 10.1063/5.003914710.1063/5.0039147 ↗
2. 10.1016/0304-8853(95)90001-210.1016/0304-8853(95)90001-2 ↗
3. 10.1103/PhysRevLett.74.327310.1103/PhysRevLett.74.3273 ↗
4. 10.1038/nmat125610.1038/nmat1256 ↗
5. 10.1063/5.000175810.1063/5.0001758 ↗
6. Honjo, H.; Nguyen, T. V. A.; Watanabe, T.; Nasuno, T.; Zhang, C.; Tanigawa, T.; Miura, S.; Inoue, H.; Niwa, M.; Yoshiduka, T.; Noguchi, Y.; Yasuhira, M.; Tamakoshi, A.; Natsui, M.; Ma, Y.; Koike, H.; Takahashi, Y.; Furuya, K.; Shen, H.; Fukami, S.; Sato, H.; Ikeda, S.; Hanyu, T.; Ohno, H.; Endoh, T. First Demonstration of Field-Free SOT-MRAM with 0.35 Ns Write Speed and 70 Thermal Stability under 400°C Thermal Tolerance by Canted SOT Structure and Its Advanced Patterning/SOT Channel Technology. 2019 IEEE International Electron Devices Meeting (IEDM); IEDM, 2019.10.1109/IEDM19573.2019.8993443 ↗
7. Garello, K.; Yasin, F.; Hody, H.; Couet, S.; Souriau, L.; Sharifi, S. H.; Swerts, J.; Carpenter, R.; Rao, S.; Kim, W.; Wu, J.; Sethu, K. K. V.; Pak, M.; Jossart, N.; Crotti, D.; Furnemont, A.; Kar, G. S. Manufacturable 300mm Platform Solution for Field-Free Switching SOT-MRAM. 2019 Symposium on VLSI Circuits; IEEE: New York, 2019; pp T194–T195.10.23919/VLSIC.2019.8778100 ↗
8. 10.3390/s2102066810.3390/s21020668 ↗
9. 10.1109/TMAG.2009.202432510.1109/TMAG.2009.2024325 ↗
10. 10.1038/nature2301110.1038/nature23011 ↗
11. 10.1038/s41586-019-1557-910.1038/s41586-019-1557-9 ↗
12. 10.1038/nature0201410.1038/nature02014 ↗
13. 10.1002/aelm.20160028210.1002/aelm.201600282 ↗
14. 10.1002/adma.20180131810.1002/adma.201801318 ↗
15. 10.1063/1.221933310.1063/1.2219333 ↗
16. 10.1103/PhysRevLett.82.61610.1103/PhysRevLett.82.616 ↗
17. 10.1103/PhysRevLett.90.18660210.1103/PhysRevLett.90.186602 ↗
18. 10.1103/PhysRevB.76.06442610.1103/PhysRevB.76.064426 ↗
19. 10.1063/1.284181210.1063/1.2841812 ↗
20. 10.1063/1.491701810.1063/1.4917018 ↗
21. 10.1103/PhysRevApplied.15.03404210.1103/PhysRevApplied.15.034042 ↗
22. 10.1038/nmat325410.1038/nmat3254 ↗
23. 10.1002/adma.20160363810.1002/adma.201603638 ↗
24. 10.1021/acsami.8b1143710.1021/acsami.8b11437 ↗
25. 10.1103/PhysRevLett.102.17680110.1103/PhysRevLett.102.176801 ↗
26. 10.1103/PhysRevB.73.17241010.1103/PhysRevB.73.172410 ↗
27. 10.1063/1.502369810.1063/1.5023698 ↗
28. 10.1103/PhysRevApplied.9.05401910.1103/PhysRevApplied.9.054019 ↗
29. 10.1021/acsami.9b0012910.1021/acsami.9b00129 ↗
30. 10.1063/1.507839510.1063/1.5078395 ↗
31. 10.1016/j.actamat.2013.07.01610.1016/j.actamat.2013.07.016 ↗
32. Haynes W. M. · 201610.1201/9781315380476 ↗
33. 10.1063/1.275357610.1063/1.2753576 ↗
34. 10.1063/1.307282710.1063/1.3072827 ↗
35. 10.1016/S0304-8853(01)00712-010.1016/S0304-8853(01)00712-0 ↗
36. 10.1103/PhysRevLett.115.15720410.1103/PhysRevLett.115.157204 ↗
37. 10.1021/acs.nanolett.9b0020510.1021/acs.nanolett.9b00205 ↗
38. 10.1103/PhysRevB.78.03330110.1103/PhysRevB.78.033301 ↗
39. 10.1103/PhysRevB.58.43210.1103/PhysRevB.58.432 ↗
40. 10.1103/PhysRevLett.79.93310.1103/PhysRevLett.79.933 ↗
41. 10.1016/0304-8853(95)00563-310.1016/0304-8853(95)00563-3 ↗
42. 10.1103/PhysRevB.31.32910.1103/PhysRevB.31.329 ↗
43. 10.1103/PhysRevB.86.18442010.1103/PhysRevB.86.184420 ↗
44. 10.1103/PhysRevB.86.02442610.1103/PhysRevB.86.024426 ↗
45. 10.1103/PhysRevB.50.1795310.1103/PhysRevB.50.17953 ↗
46. 10.1103/PhysRevB.47.55810.1103/PhysRevB.47.558 ↗
47. 10.1016/0927-0256(96)00008-010.1016/0927-0256(96)00008-0 ↗
48. 10.1103/PhysRevB.54.1116910.1103/PhysRevB.54.11169 ↗
49. 10.1103/PhysRevLett.77.386510.1103/PhysRevLett.77.3865 ↗
50. 10.1016/j.ultramic.2015.10.02010.1016/j.ultramic.2015.10.020 ↗