journal article·1977-06

Thick film adherence fracture energy: influence of alumina substrates

P. F. Becher, J. S. Murday

Journal of Materials Science· Volume 12· Issue 6
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Copper Interconnects and Reliability · Electronic Packaging and Soldering Technologies · Theoretical and Computational Physics

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References (14)

Show source-provided references
1. P. F. Becher andW. L. Newell,J. Mater. Sci. 12 (1977) 90.10.1007/BF00738474 ↗
2. P. F. Becher, W. D. Bascom, J. L. Bitner andJ. S. Murday, Proceedings of the International Microelectronics Symposium International Society for Hybrid Microelectronics, Montgomery, Alabama (1975) pp. 279–286.
3. C. J. Peckinpaugh andR. Tuggle, Proceedings of the International Microelectronics Symposium International Society for Microelectronics (Park Ridge, III. 1968) pp. 417–421.
4. S. S. Cole andF. J. Hynes,Bull Amer. Ceram. Soc. 37 (1958) 135.
5. J. R. Floyd,ibid 42 (1963) 65.
6. T. T. Hitch, E. J. Conlon andW. I. Rogers, in [2] pp. 287–295.
7. S. W. Freiman, D. R. Mulville andP. W. Mast,J. Mater. Sci. 8 (1973) 1527.10.1007/BF00754886 ↗
8. Y. Nakada andT. L. Schock,J. Amer. Ceram. Soc. 58 (1975) 409.10.1111/j.1151-2916.1975.tb19010.x ↗
9. F. V. Dimarcello, P. L. Key andJ. C. Williams,J. Amer. Ceram. Soc. 55 (1972) 509.10.1111/j.1151-2916.1972.tb13418.x ↗
10. P. F. Becher, W. L. Newell andR. W. Rice, Progress Report, NAVAIR, AIRTASK A310310B/ 4R2103-001, NRL, Washington, D.C., January 1975.
11. D. R. Biswas andR. M. Fulrath,J. Amer. Ceram. Soc. 58 (1975) 526.10.1111/j.1151-2916.1975.tb18777.x ↗
12. N. Claussen ibid 59 (1976) 49.10.1111/j.1151-2916.1976.tb09386.x ↗
13. S. W. Freiman andL. L. Hence,ibid 55 (1972) 86.10.1111/j.1151-2916.1972.tb11216.x ↗
14. R. C. Sundahl,J. Vac. Sci. Technol. 9 (1971) 181.10.1116/1.1316548 ↗