Growth of aligned ZnO nanorods on transparent electrodes by hybrid methods

The fabrication of ZnO (80 nm) thin film was achieved by hybrid atomic layer deposition (ALD) to prevent the reaction between the reactants and conductive layer of the substrates. ZnO nanorods (ZnO-NRs) growth over the substrates was performed by wet chemical procedure in which Zn(NO3)2 and hexamethylenetetramine were used as the precursors. HR-TEM, SAED, FE-SEM, X-ray diffraction (XRD), and UV–Vis spectroscopy were employed to characterize the ZnO-NRs samples on the substrates. XRD and HR-TEM analyses confirmed that the ZnO nanorod structure is hexagonal wurtzite type with growth in the [0001] direction. Length and thickness of the ZnO-NRs ranged between 45 and 90 nm and 480 and 600 nm, respectively. It was observed that the growth rate of NRs in [0001] direction is 10 times higher than in [1000] direction. The growth mechanism and resulted dimensions of nanorods are function of the synthesis parameters (in hybrid ALD process) such as reaction time, temperature, precursor molar ratio, and thickness of ZnO film.