Boron carbide coatings prepared by cathodic arc deposition
Source abstract
Abstract
Boron carbide films are attractive materials for use as tribologcal coatings for low and high operating temperatures, especially for applications that require high hardness. The properties of boron carbide films prepared by cathodic arc using a heated B4C cathode are investigated. The B:C ratio in the film was about 3, and the only detected impurity was oxygen with a content below 5%. The effect of substrate bias on the film characteristics was studied. A direct correlation between hardness and elastic modulus and bias voltage applied to the substrate was observed for bias voltages in the interval of 0–500 V. Microstructure and chemistry of the films were investigated using X-ray diffraction, electron microscopy and X-ray absorption spectroscopy.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Advanced ceramic materials synthesis · Vacuum and Plasma Arcs · Metal and Thin Film Mechanics
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References (15)
Show source-provided references
1. M. Beauvy, J. Less Common Metals 90 (1983) 169.10.1016/0022-5088(83)90067-X ↗
2. R. Lazzari, N. Vast, J. M. Besson, S. Baroni and A. Dal Corso, Phys. Rev. Lett. 83 (1999) 3230.10.1103/PhysRevLett.83.3230 ↗
3. D. R. Tallant, T. L. Aselage, A. N. Campbell and D. Emin, Phys. Rev. B (Condensed Matter) 40 (1989) 5649.10.1103/PhysRevB.40.5649 ↗
4. T. Hu, L. Steihl, W. Rafaniello, T. Fawcett, D. D. Hawn, J. G. Mashall, S. J. Rozeveld, C. L. Putzig, J. H. Blackson, W. Cermignani and M. G. Robinson, Thin Solid Films 332 (1998) 80.10.1016/S0040-6090(98)01019-0 ↗
5. S. Ulrich, H. Ehrhardt, J. Schwan, R. Samlenski and R. Brenn, Diamond and Related Materials 7 (1998) 835.10.1016/S0925-9635(97)00306-3 ↗
6. T. Eckardt, K. Bewilogua, G. van Der Kolk, T. Hurkmans, T. Trinh and W. Fleischer, Surf. Coat. Tech. 126 (2000) 69.10.1016/S0257-8972(00)00525-9 ↗
7. O. B. Postel and V. R. Heberlein, Diamond and Related Materials 8 (1999) 1878.10.1016/S0925-9635(99)00147-8 ↗
8. H. Shinno, T. Tanabe, M. Fujitsuka and Y. Sakai, Thin Solid Films 189 (1990) 149.10.1016/0040-6090(90)90035-C ↗
9. R. L. Boxman and S. Goldsmith, IEEE Trans. Plasma Sci. 17 (1989) 705.10.1109/27.41186 ↗
10. I. G. Brown, Ann. Rev. Mater. Sci. 28 (1998) 243.10.1146/annurev.matsci.28.1.243 ↗
11. C. C. Klepper, J. Niemel, R. C. Hazelton, E. J. Yadlowsky and O. R. Monteiro, Fusion Technology 39(2) (2001) 910.10.13182/FST01-A11963356 ↗
12. R. A. Macgill, M. R. Dickinson, A. Anders, O. R. Monteiro and I. G. Brown, Rev. Sci. Instrum. 69 (1998) 801.10.1063/1.1148718 ↗
13. F. Kokai, M. Taniwaki, K. Takahashi, A. Goto, M. Ishihara, K. Yamamoto and Y. Koga, Diamond and Related Materials 10 (2001) 1412.10.1016/S0925-9635(00)00409-X ↗
14. H. Y. Chen, J. Wang, H. Yang, W. Z. Li and H. D. Li, Surf. Coat. Tech. 128/129 (2000) 329.10.1016/S0257-8972(00)00599-5 ↗
15. D. Zhang, D. M. Davalle, W. L. O'Brien and D. N. McIlrony, Surf. Sci. 461 (2000) 16.10.1016/S0039-6028(00)00478-7 ↗