journal article·1999-03

Comparison of compound layer nucleation mechanisms in plasma nitriding and nitrocarburizing: the effect of CHn species

Shi Li, Rafael R. Manory

Journal of Materials Science· Volume 34· Issue 5
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Abstract

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Research context

OpenAlex topics: Metal and Thin Film Mechanics · Plasma Diagnostics and Applications · Semiconductor materials and devices

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References (18)

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