journal article·1995-04

Parametric study of the plasma synthesis of ultrafine silicon nitride powders

G. Soucy, J. W. Jurewicz, M. I. Boulos

Journal of Materials Science· Volume 30· Issue 8
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Abstract

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Research context

OpenAlex topics: Advanced ceramic materials synthesis · Semiconductor materials and devices · MXene and MAX Phase Materials

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References (24)

Show source-provided references
1. Hains Technology Associate and MKM Consultants International, “Impact of Advanced Ceramics on Ontario Industry”, Ontario Ministry of Northern Development and Mines, Industrial Mineral Background Paper 9 (1988) 96 pp.
2. L. M. SHEPPARD, Am. Ceram. Soc. Bull. 68 (1989) 979.
3. C. B. LAFLAMME, G. SOUCY, J. JUREWICZ and M. I. BOULOS, J. High Temp. Chem. Process. 1 (1992) 283.
4. T. TSUTSUMI, in “Silicon Nitride-1” Vol. 1, edited by S. SOMIYA, M. MITOMO and M. YOSHIMURA, Ceramic Research and Development in Japan (Elsevier Science, New York, 1990) pp. 13–23.
5. H. W. RHODES and S. NATANSOHN, Am. Ceram. Soc. Bull. 68 (1989) 1804.
6. T. ISHII, A. SANO and I. IMAI, in “Silicon Nitride-1”, Vol. 1, edited by S. SOMIYA, M. MITOMO and M. YOSHIMURA, Ceramic Research and Development in Japan (Elsevier Science, New York, 1990) pp. 59–69.
7. Y. KOHTOKU, ibid.in “ pp. 71–80.
8. K. NAKAGAMA and M. KATO, ibid.in “ pp. 25–37.
9. T. ARAKAWA, ibid.in “ pp. 81–92.
10. M. NAKAMURA, Y. KURANARI and Y. IMAMURA, ibid.in “ pp. 39–58.
11. T. HUSSAIN and V. J. IBBERSON, in the “7th International Symposium on Plasma Chemistry”, Symposium Proceedings edited by C. S. TIMMERMANS, Eindhoven, The Netherlands; 1–5 July, 1985 (IUPAC Subcommittee of Plasma Chemistry) Eindhoven, Vol. 2 (1985) pp. 692–96.
12. R. LI and W. GU, in “Production and Processing of Fine Particles”, Proceedings of the International Symposium on the Production and Processing of Fine Particles, edited by A. S. PLUMPTON from Centre de recherche minérales, Saint Foy, Montreal, Québec, Canada. August 28–31, 1988. © The Canadian Institute of Mining and Metallurgy (Pergamon Press, New York, USA) pp. 559–68.10.1016/B978-0-08-036448-3.50060-8 ↗
13. J. SZÉPVÖLGYI, I. TÓTH and T. SZÉKELY, Collo. Phys. (C5) suppl. J. Phys. 51 (18) (1990) C5–35.
14. T. YOSHIDA, H. ENDO, K. SAITO and K. AKASHI, in, “6th International Symposium on Plasma Chemistry”, Symposium Proceedings edited by M. I. BOULOS and R. J. MUNZ, Montréal, Québec, Canada, IUPAC Subcommittee of Plasma Chemistry, Vol. 1, 24–28 July 1983, p. 225.
15. H. J. LEE, K. EGUCHI and T. YOSHIDA, J. Amer. Ceram. Soc. 73(11) (1990) 3356.10.1111/j.1151-2916.1990.tb06461.x ↗
16. L. M. SHEPPARD, Am. Ceram. Soc. Bull. 70(4) (1991) 692.
17. G. LANTAGNE, B. MARCOS and B. CAYROL, Comput. Chem. Eng. 12 (1988) 589.10.1016/0098-1354(88)87008-X ↗
18. M. W. CHASE, C. A. DAVIES, J. R. DOWNEX, D. J. FRURIP, R. A. MCDONALD and A. N. SYVERUD, J. Phys. Chem. Ref. Data 14 suppl. 1 (1985) 1856.
19. M. E. COLTRIN, R. J. KEE and J. A. MILLER, J. Electrochem. Soc. Solid State Sci. Technol. 131 (1984) 425.
20. G. SOUCY, J. W. JUREWICZ and M. I. BOULOS, Plasma Chem. Plasma Process. 14 (1994) 43.10.1007/BF01448736 ↗
21. Idem, ibid. 14 (1994) 59.10.1007/BF01448737 ↗
22. Idem, ibid. 14 (1994) 59.10.1007/BF01448737 ↗
23. G. SOUCY, PhD thesis, Chemical Engineering Department, Université de Sherbrooke, Sherbrooke, Québec (1992) 234 pp.
24. D. S. PHILLIPS and G. J. VOGT, Mater. Res. Soc. Bull. 12 (1987) 54.10.1557/S0883769400066963 ↗