Preparation of thin films of MnO2 and CeO2 by a modified chemical bath (oxidative-soak-coating) method
Source abstract
Abstract
Thin films of MnO2 and CeO2 were deposited on glass substrates directly from aqueous solutions in a temperature range from 313 to 333 K by a modified chemical bath deposition technique. The principle of the film deposition was based on the oxidation of Mn2+ and Ce3+ ions in homogeneous solutions and subsequent heterogeneous nucleation of MnO2 and CeO2 on the substrates. We have named this method as “oxidative-soak-coating” method. The film thicknesses after a 24-hour deposition were 1 μm and 60 nm, respectively. Thin films consisting of Mn3O4 and MnOOH were also deposited by changing the pH of the starting solutions for the deposition of MnO2. The effects of the composition of the starting solution, deposition temperature, and the compatibility of the substrates to the film substances were investigated.
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OpenAlex topics: Catalytic Processes in Materials Science · ZnO doping and properties · Gas Sensing Nanomaterials and Sensors
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References (26)
Show source-provided references
1. S. C. Pang, M. A. Anderson and T. W. Chapman, J. Electrochem. Soc. 147 (2000) 444.10.1149/1.1393216 ↗
2. S. C. Pang and M. A. Anderson, J. Mater. Res. 15 (2000) 2096.10.1557/JMR.2000.0302 ↗
3. M. Chigane and M. Ishikawa, J. Electrochem. Soc. 147 (2000) 2246.10.1149/1.1393515 ↗
4. J. W. Long, L. R. Qadir, R. M. Stroud and D. R. Rolison, J. Phys. Chem. B 105 (2001) 8712.10.1021/jp0112830 ↗
5. O. Giraldo, S. L. Brock, W. S. Willis, M.Marquez, S. L. Suib and S. Ching, J. Amer. Chem. Soc. 122 (2000) 9330.10.1021/ja001860i ↗
6. H. Surbeck, Appl. Radiation and Isotopes 53 (2000) 97.10.1016/S0969-8043(00)00119-6 ↗
7. T. Maruyama, J. Mater. Sci. Lett. 19 (2000) 1723.10.1023/A:1006714631969 ↗
8. S. E. Lee, S. W. Choi and J. Yi, Thin Solid Films 376 (2000) 208.10.1016/S0040-6090(00)01205-0 ↗
9. V. Petrovsky, B. P. Gorman, H. U. Anderson and T. Petrovsky, J. Appl. Phys. 90 (2001) 2517.10.1063/1.1389329 ↗
10. A. Nazeri, P. P. Trzaskoma-Paulette and D. Bauer, J. Sol-Gel Sci. Tech. 10 (1997) 317.10.1023/A:1018381503008 ↗
11. F. Czerwinski and J. A. Szpunar, ibid. 9 (1997) 103.10.1023/A:1026420609370 ↗
12. T. Suzuki, I. Kosacki and H. U. Anderson, J. Amer. Ceram. Soc. 84 (2001) 2007.10.1111/j.1151-2916.2001.tb00950.x ↗
13. K. Konstantinov, I. Stambolova, P. Peshev, B. Darriet and S. Vassilev, Int. J. Inorg. Mater. 2 (2000) 277.10.1016/S1466-6049(00)00024-6 ↗
14. B. El Idrissi, M. Addou, A. Outzourhit, M. Regragui, A. Bougrine and A. Kachouane, Solar Energy Mater. Solar Cells 69 (2001) 1.10.1016/S0927-0248(00)00254-3 ↗
15. T. P. Niesen and M. R. De Guire, J. Electroceram. 6 (2001) 169.10.1023/A:1011496429540 ↗
16. D. Raviendra and J. K. Sharma, J. Appl. Phys. 58 (1985) 838.10.1063/1.336310 ↗
17. F. C. Eze, J. Phys. D: Appl. Phys. 32 (1999) 533.10.1088/0022-3727/32/5/006 ↗
18. S. Supothina and M. R. De Guire, Thin Solid Films 371 (2000) 1.10.1016/S0040-6090(00)00989-5 ↗
19. S. Baskaran, L. Song, J. Liu, Y. L. Chen and G. L. Graff, J. Amer. Ceram. Soc. 81 (1998) 401.10.1111/j.1151-2916.1998.tb02347.x ↗
20. H. Nagayama, H. Hondo and H. Kuwahara, J. Electrochem. Soc. 135 (1988) 2013.10.1149/1.2096198 ↗
21. M. Abe and Y. Tamaura, J. Appl. Phys. 55 (1984) 2614.10.1063/1.333254 ↗
22. M. Abe and T. Itoh and Y. Tamaura, Thin Solid Films 216 (1992) 155.10.1016/0040-6090(92)90887-H ↗
23. W. Mindt, J. Electrochem. Soc. 118 (1971)93.10.1149/1.2407961 ↗
24. H. Unuma, H. Takabatake, K. Watanabe, T. Ogata and M. Sugawara, J. Mater. Sci. Lett. 21 (2002) 1241.10.1023/A:1016546817413 ↗
25. M. Izaki, T. Saito, M. Chigane, M. Ishikawa, J. Katayama, M. Inoue and M. Yamashita, J. Mater. Chem. 11 (2001) 1972.10.1039/b104358g ↗
26. Q. Feng, H. Kanoh and K. Ooi, J. Mater. Chem. 9 (1999) 319.10.1039/a805369c ↗