The mechanism of reactive sputtering
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Abstract
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Nuclear Materials and Properties
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References (17)
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9. M. G. Cowgill and J. Stringer, J. Less-Common Metals 2 (1960) 233.10.1016/0022-5088(60)90017-5 ↗
10. P. Kofstad, J. Inst. Metals 90 (1961?2) 253.
11. G. K. Wehner, Annual Report on Sputtering Yields, Mechanical Division of General Mills Inc., Research Department (1959?60). (National Lending Library (UK), Cat. No. 6413-35F).
12. P. J. Harrop and D. S. Campbell, ?Handbook of Thin Film Technology?, edited by R. Glang and L. I. Maissel (McGraw-Hill, New York, to be published in 1968).
13. P. A. Walley and A. K. Jonscher, Thin Solid Films 1 (1967?8) 367.10.1016/0040-6090(68)90026-6 ↗
14. P. Stuart, National Physical Laboratory, Teton, Middx, UK, private communication.
15. R. W. Hoffman, ?Thin Films? (Amer. Soc. Metals, 1964, p. 99.
16. D. S. Campbell, ?Handbook of Thin Film Technology?, edited by R. Glang and L. I. Maissel (McGraw-Hill, New York, to be published in 1968).
17. R. E. Pawel and J. J. Campbell, Acta. Met. 14 (1966) 1827.10.1016/0001-6160(66)90035-6 ↗