Stability to moisture for chemically vapour-deposited boron nitride
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Advanced ceramic materials synthesis · Metal and Thin Film Mechanics · Boron and Carbon Nanomaterials Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (11)
Show source-provided references
1. M. Basche, US Patent 3152006 (1964).
2. M. Sang andM. Aoki,Thin Solid Films 83 (1981) 247.10.1016/0040-6090(81)90674-X ↗
3. S. Motojima, Y. Tamura andK. Sugiyama,ibid. 88 (1982) 269.10.1016/0040-6090(82)90056-6 ↗
4. T. Matsuda, N. Uno, H. Nakae andT. Hirai,J. Mater. Sci. 21 (1986) 649.10.1007/BF01145537 ↗
5. T. Matsuda, H. Nakae andT. Hirai,ibid. 23 (1988) 509.10.1007/BF01174677 ↗
6. R. Geick, C. H. Perry andG. Rupprecht,Phys. Rev. 146 (1966) 543.10.1103/PhysRev.146.543 ↗
7. J. J. Gebhardt, in Proceedings of the 4th International Conference on Chemical Vapor Deposition, edited by G. F. Wakefield and J. M. Blocher Jr. (The Electrochemical Society, Inc., Princeton, 1973) p. 460.
8. M. J. Rand andJ. F. Roberts,J. Electrochem. Soc. 115 (1968) 423.10.1149/1.2411238 ↗
9. T. Takahashi, H. Itoh andM. Kuroda,J. Cryst. Growth 53 (1981) 418.10.1016/0022-0248(81)90092-0 ↗
10. T. E. O'Connor, US Patent 3241919 (1966).
11. J. Economy andR. V. Anderson,J. Polymer Sci. Part C 19 (1967) 283.10.1002/polc.5070190122 ↗