journal article·2025-05

Exploration on functional groups of complexing agents during chemical mechanical polishing for Co interconnects

Lifei Zhang, Xinchun Lu

Journal of Materials Science· Volume 60· Issue 19
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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Advanced Surface Polishing Techniques · Semiconductor materials and devices · Copper Interconnects and Reliability

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References (30)

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