journal article·2025-03-25Open access

Unveiling the Significant Role of Schottky Interfaces for Threshold Voltage in Ovonic Threshold Switching

Shogo Hatayama, Keisuke Hamano, Yi Shuang, Mihyeon Kim, Paul Fons, Yuta Saito

Abstract

High Resolution Image Download MS PowerPoint Slide Ovonic threshold switching (OTS) is a type of volatile resistive switching primarily observed in amorphous chalcogenides. The switching process involves an abrupt transition from a high-resistance state to a low-resistance state when a voltage above a specific threshold ( V th ) is applied. OTS materials serve as selectors in nonvolatile memories with 3D XPoint-type structures, in combination with phase-change materials (PCMs), which exhibit threshold-type nonvolatile resistive switching. Despite the existence of transport models that can explain the OTS behavior, the role of the metal–OTS interface has been underexplored. This study employs angle-resolved hard X-ray photoelectron spectroscopy to investigate the interfacial electronic structure of Ge–Te-based OTS materials with different metal electrodes. The results indicate that V th varies with the work function of the contact metal because the onset voltage for impact ionization is affected by band bending at the interface. Our findings reveal that interfacial properties significantly influence OTS behavior, offering a novel method for controlling V th . This study underscores the importance of selecting appropriate metal contacts for optimizing the performance of OTS devices.
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Research context

OpenAlex topics: Phase-change materials and chalcogenides · Advanced Memory and Neural Computing · Semiconductor materials and interfaces

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Semiconductor Frontier Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 2, Umezono 1-1-1, Tsukuba 305-8568, Japan

Department of Electronics and Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan

WPI Advanced Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

Department of Materials Science, Graduate School of Engineering, Tohoku University, 6-6-11, Aoba-yama, Aoba-ku, Sendai 980-8579, Japan

Research Center for Green X-Tech, Tohoku University, 6-6-11, Aoba-yama, Aoba-ku, Sendai 980-8579, Japan

Funding

Japan Society for the Promotion of Science · Japan Science and Technology Corporation · Iketani Science and Technology Foundation

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