journal article·2017-06Open access

Atomic/molecular layer deposition of hybrid inorganic–organic thin films from erbium guanidinate precursor

Lukas Mai, Zivile Giedraityte, Marcel Schmidt, Detlef Rogalla, Sven Scholz, Andreas D. Wieck, Anjana Devi, Maarit Karppinen

Journal of Materials Science· Volume 52· Issue 11

Abstract

Luminescent erbium-based inorganic–organic hybrid materials play an important role in many frontier nano-sized applications, such as amplifiers, detectors and OLEDs. Here, we demonstrate the possibility to fabricate high-quality thin films comprising both erbium and an appropriate organic molecule as a luminescence sensitizer utilizing the combined atomic layer deposition and molecular layer deposition (ALD/MLD) technique. We employ tris(N,N′-diisopropyl-2-dimethylamido guanidinato)erbium(III) [Er(DPDMG)3] together with 3,5-pyridine dicarboxylic acid as precursors. With the appreciably high film deposition rate achieved (6.4 A cycle−1), the guanidinate precursor indeed appears as an interesting new addition to the ALD/MLD precursor variety toward novel materials. Our erbium–organic thin films showed highly promising UV absorption properties and a photoluminescence at 1535 nm for a 325-nm excitation, relevant to possible future luminescence applications.
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Research context

OpenAlex topics: Semiconductor materials and devices · Lanthanide and Transition Metal Complexes · Luminescence Properties of Advanced Materials

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