Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate
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OpenAlex topics: Copper Interconnects and Reliability · Semiconductor materials and devices · Semiconductor materials and interfaces
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References (6)
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4. M. Skibo andF. A. Greulich,Thin Solid Films 113 (1984) 225.10.1016/0040-6090(84)90225-6 ↗
5. R. L. Van Hemert, L. B. Spendlove andR. E. Sievers,J. Electrochem. Soc. 112 (1965) 1123.10.1149/1.2423376 ↗
6. C. H. J. Van Den Brekel, R. M. M. Fonville, P. J. M. Van Der Straten andG. Verspui, in Proceedings of 8th International Conference on Chemical Vapor Deposition, edited by J. M. Blocher Jr, G. E. Vuillard and G. Wahl, Pennington, NJ (Electrochemical Society, Pennington, NJ, 1981) p. 142.