Influence of interfacial carbide layer characteristics on thermal properties of copper–diamond composites
Source abstract
Abstract
Copper–diamond composites are increasingly being considered for thermal management applications because of their attractive combination of properties, such as high thermal conductivity (λ) and low coefficient of thermal expansion (CTE). In this research, thermal properties of Cu–diamond composites with two different types of interfacial carbides (Cr3C2 and SiC) were studied. The interface thermal conductance (h c) was calculated with Maxwell mean-field and differential effective medium schemes, wherein experimentally measured λ was entered as an input parameter. The λ and h c of both the Cu–Cr3C2–diamond and Cu–SiC–diamond composites are higher than those reported in previous studies for Cu–diamond composites with no interfacial carbides. The value of h c is intimately related to the morphology and thickness of the interface carbide layer, with the highest h c being associated with a thin and continuous interface carbide layer. A lower h c resulting from a thicker Cr3C2 layer can provide an alternate explanation for a previously reported trend in λ of Cu–Cr3C2–diamond composites with different Cr-contents. The experimentally measured CTE was compared with the Turner and Kerner model predictions. The CTE of both the Cu–Cr3C2–diamond and Cu–SiC–diamond composites is lower and better matches the model predictions than the previously reported CTE of Cu–diamond composite with no interfacial carbides. The CTE of Cu–Cr3C2–diamond composites agrees better with the Kerner model than the Turner model, which suggests that deformation during temperature excursions involves shear.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Advanced ceramic materials synthesis · Aluminum Alloys Composites Properties · Numerical methods in engineering
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (37)
Show source-provided references
1. Zweben C (2004) In: Zediker MS (ed) High-power diode laser technology and applications II, Proc SPIE, vol 5336, Bellingham, WA, pp 166–17510.1117/12.529177 ↗
2. Ludtke A, Leichtfried G (2006) Patent No. US 0157884 Al
3. Weber L, Tavangar R (2007) Scr Mater 57:98810.1016/j.scriptamat.2007.08.007 ↗
4. Schubert T, Ciupiński Ł, Zieliński W, Michalski A, Weißgärber T, Kieback B (2008) Scr Mater 58:26310.1016/j.scriptamat.2007.10.011 ↗
5. Schubert T, Weißgärber T, Kieback B (2009) Adv Mater Res 59:16910.4028/www.scientific.net/AMR.59.169 ↗
6. Schubert T, Trindade B, Weißgärber T, Kieback B (2008) Mater Sci Eng A 475:3910.1016/j.msea.2006.12.146 ↗
7. Pierson HO (1996) Handbook of refractory carbides and nitrides: properties, characteristics, processing and applications. Noyes Publications, Westwood, p 146
8. Ault NN (2001) In: Buschow KHJ, Cahn RW, Flemings MC, Ilschner B, Kramer EJ, Mahajan S (eds) Encyclopedia of materials—science and technology, vol 9. Elsevier Science Ltd., Oxford, pp 8506–8507
9. Neudeck PG (2001) In: Buschow KHJ, Cahn RW, Flemings MC, Ilschner B, Kramer EJ, Mahajan S (eds) Encyclopedia of materials—science and technology, vol 9. Elsevier Science Ltd., Oxford, p 8509
10. Harris GL (1995) Properties of silicon carbide, INSPEC. The Institution of Electrical Engineers, London, p 5
11. Pierson HO (1996) Handbook of refractory carbides and nitrides: properties, characteristics, processing and applications. Noyes Publications, Westwood, p 148
12. Pierson HO (1996) Handbook of refractory carbides and nitrides: properties, characteristics, processing and applications. Noyes Publications, Westwood, p 103
13. Yang X, Yue-Qing S, Chen-Guang L, Shun C, Zhen-Zheng F (2009) Trans Nonferrous Met Soc China 19:116110.1016/S1003-6326(08)60422-7 ↗
14. Sundberg G, Paul P, Sung C, Vasilos T (2004) Adv Microelectron 31(6):8
15. Sundberg G, Paul P, Sung C, Vasilos T (2005) J Mater Sci 40:3383. doi: 10.1007/s10853-005-2847-110.1007/s10853-005-2847-1 ↗
16. Sundberg G, Paul P, Sung C, Vasilos T (2006) J Mater Sci 41:485. doi: 10.1007/s10853-005-2622-310.1007/s10853-005-2622-3 ↗
17. Pickard SM, Withers JC, Loutfy RO (2007) Patent No. US 7279023 B2
18. Spowart JE, Maruyama B, Miracle DB (2008) Patent No. US 7364692 B1
19. Lide DR (2009) CRC handbook of chemistry and physics, 90th edn. Taylor & Francis Group, Boca Raton, p 4-135
20. Barin I (1995) Thermochemical data of pure substances, vol 1, 3rd edn. VCH, Weinheim, p 21110.1002/9783527619825 ↗
21. Waldo RA, Militello MC, Gaarenstroom SW (1993) Surf Interface Anal 20:11110.1002/sia.740200204 ↗
22. Pouchou JL, Pichoir F (1993) Scanning Microsc Suppl 7:167
23. Pouchou JL (1993) Anal Chim Acta 283:8110.1016/0003-2670(93)85212-3 ↗
24. Maxwell JC (1946) A treatise on electricity and magnetism, vol I, 3rd edn. Oxford University Press, London, p 440
25. Yoshida K, Morigami H (2004) Microelectron Reliab 44:30310.1016/S0026-2714(03)00215-4 ↗
26. Hasselman DPH, Johnson LF (1987) J Compos Mater 21(6):50810.1177/002199838702100602 ↗
27. Weber L, Fischer C, Mortensen A (2003) Acta Mater 51:49510.1016/S1359-6454(02)00432-9 ↗
28. Weber L, Dorn J, Mortensen A (2003) Acta Mater 51:319910.1016/S1359-6454(03)00141-1 ↗
29. Tavangar R, Molina JM, Weber L (2007) Scr Mater 56:35710.1016/j.scriptamat.2006.11.008 ↗
30. Swartz ET, Pohl RO (1989) Rev Mod Phys 61(3):60510.1103/RevModPhys.61.605 ↗
31. Chu K, Liu Z, Jia C, Chen H, Liang X, Gao W, Tian W, Guo H (2010) J Alloy Compd 490:45310.1016/j.jallcom.2009.10.040 ↗
32. Chu K, Jia C, Liang X, Chen H, Gao W, Guo H (2009) Mater Des 30:431110.1016/j.matdes.2009.04.019 ↗
33. Turner PS (1946) J Res Natl Bur Stand 37:23910.6028/jres.037.015 ↗
34. Kerner EH (1956) Proc Phys Soc B 69:80810.1088/0370-1301/69/8/305 ↗
35. Lemieux S, Elomari S, Nemes JA, Skibo MD (1998) J Mater Sci 33:4381. doi: 10.1023/A:100443703222410.1023/A:1004437032224 ↗
36. Hsieh CL, Tuan WH (2007) Mater Sci Eng A 460–461:45310.1016/j.msea.2007.01.109 ↗
37. Yamamoto Y, Imai Y, Tanabe K, Tsuno T, Kumazawa Y, Fujimori N (1997) Diam Relat Mater 6:105710.1016/S0925-9635(96)00772-8 ↗