DataVXJournal of Materials SciencePaper
journal article·2023-06

Recent developments in magnetron-sputtered silicon nitride coatings of improved mechanical and tribological properties for extreme situations

Akula Umamaheswara Rao, Sunil Kumar Tiwari, Manjeet Singh Goyat, Amit Kumar Chawla

Journal of Materials Science· Volume 58· Issue 24
Publisher page
Bibliographic record

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

Source: Not provided · Quality: missing

Research context

OpenAlex topics: Metal and Thin Film Mechanics · Diamond and Carbon-based Materials Research · Boron and Carbon Nanomaterials Research

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (100+)

Show source-provided references
1. Fotovvati B, Namdari N, Dehghanghadikolaei A (2019) On coating techniques for surface protection: a review. J Manuf Mater Process. https://doi.org/10.3390/jmmp301002810.3390/jmmp3010028 ↗
2. Bouzakis KD, Michailidis N, Skordaris G et al (2012) Cutting with coated tools: Coating technologies, characterization methods and performance optimization. CIRP Ann - Manuf Technol 61:703–723. https://doi.org/10.1016/j.cirp.2012.05.00610.1016/j.cirp.2012.05.006 ↗
3. Filho LC, Schmidt S, López A et al (2019) The effect of coating density on functional properties of SiNx coated implants. Materials (Basel) 12:3370. https://doi.org/10.3390/ma1220337010.3390/ma12203370 ↗
4. Migliuolo M, Schlesinger TE (1998) Electro-optic thin films by magnetron sputtering. Nuovo Cim D 20:1209–1219. https://doi.org/10.1007/BF0318553210.1007/BF03185532 ↗
5. Mangalaraj D, Radhakrishnan M, Balasubramanian C (1982) Electrical conduction and breakdown properties of silicon nitride films. J Mater Sci 17:1474–1478. https://doi.org/10.1007/BF0075226210.1007/BF00752262 ↗
6. Petrman V, Houska J (2013) Trends in formation energies and elastic moduli of ternary and quaternary transition metal nitrides. J Mater Sci 48:7642–7651. https://doi.org/10.1007/s10853-013-7582-410.1007/s10853-013-7582-4 ↗
7. Kaloyeros AE, Jové FA, Goff J, Arkles B (2017) Review—silicon nitride and silicon nitride-rich thin film technologies: trends in deposition techniques and related applications. ECS J Solid State Sci Technol 6:P691–P714. https://doi.org/10.1149/2.0011710jss10.1149/2.0011710jss ↗
8. Krstic Z, Krstic VD (2012) Silicon nitride: the engineering material of the future. J Mater Sci 47:535–552. https://doi.org/10.1007/s10853-011-5942-510.1007/s10853-011-5942-5 ↗
9. Tiwari R, Chandra S (2011) Effect of substrate temperature on properties of silicon nitride films deposited by RF magnetron sputtering. In: Advanced materials research. pp 187–190. https://doi.org/10.4028/www.scientific.net/AMR.254.18710.4028/www.scientific.net/AMR.254.187 ↗
10. Filho LC, Schmidt S, Goyenola C et al (2020) The effect of N, C, Cr, and Nb content on silicon nitride coatings for joint applications. Mater (Basel). https://doi.org/10.3390/MA1308189610.3390/MA13081896 ↗
11. Baptista A, Silva F, Porteiro J et al (2018) Sputtering physical vapour deposition (PVD) coatings: a critical review on process improvement andmarket trend demands. Coatings 8:402. https://doi.org/10.3390/coatings811040210.3390/coatings8110402 ↗
12. Deng Y, Chen W, Li B et al (2020) Physical vapor deposition technology for coated cutting tools: a review. Ceram Int 46:18373–18390. https://doi.org/10.1016/j.ceramint.2020.04.16810.1016/j.ceramint.2020.04.168 ↗
13. Zhang C, Vispute RD, Fu K, Ni C (2023) A review of thermal properties of CVD diamond films. J Mater Sci 58:3485–3507. https://doi.org/10.1007/s10853-023-08232-w10.1007/s10853-023-08232-w ↗
14. Kommu S, Wilson GM, Khomami B (2000) A theoretical/experimental study of silicon epitaxy in horizontal single-wafer chemical vapor deposition reactors. J Electrochem Soc 147:1538. https://doi.org/10.1149/1.139339110.1149/1.1393391 ↗
15. Meyerson BS (1986) Low-temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition. Appl Phys Lett 48:797–799. https://doi.org/10.1063/1.9667310.1063/1.96673 ↗
16. Hsieh TY, Jung KH, Kwong DL, Lee SK (1991) Silicon homoepitaxy by rapid thermal processing chemical vapor deposition (RTPCVD)—a review. J Electrochem Soc 138:1188–1207. https://doi.org/10.1149/1.208573910.1149/1.2085739 ↗
17. Meyyappan M (2009) A review of plasma enhanced chemical vapour deposition of carbon nanotubes. J Phys D Appl Phys 42:213001. https://doi.org/10.1088/0022-3727/42/21/21300110.1088/0022-3727/42/21/213001 ↗
18. Dorval Dion CA, Tavares JR (2013) Photo-initiated chemical vapor deposition as a scalable particle functionalization technology (a practical review). Powder Technol 239:484–491. https://doi.org/10.1016/j.powtec.2013.02.02410.1016/j.powtec.2013.02.024 ↗
19. Alemohammad H, Toyserkani E (2010) Laser-assisted additive fabrication of micro-sized coatings. In: Advances in laser materials processing. Elsevier, pp 735–76210.1533/9781845699819.7.735 ↗
20. Hou X, Choy K-L (2006) Processing and applications of aerosol-assisted chemical vapor deposition. Chem Vap Depos 12:583–596. https://doi.org/10.1002/cvde.20060003310.1002/cvde.200600033 ↗
21. Struppert T, Heft A, Grünler B (2012) Thin functional films by combustion chemical vapour deposition (C-CVD). Thin Solid Films 520:4106–4109. https://doi.org/10.1016/j.tsf.2011.06.04810.1016/j.tsf.2011.06.048 ↗
22. Chandrasekhar R, Choy KL (2001) Electrostatic spray assisted vapour deposition of fluorine doped tin oxide. J Cryst Growth 231:215–221. https://doi.org/10.1016/S0022-0248(01)01477-410.1016/S0022-0248(01)01477-4 ↗
23. Dapkus PD (1982) Metalorganic chemical vapor deposition. Annu Rev Mater Sci 12:243–269. https://doi.org/10.1146/annurev.ms.12.080182.00133110.1146/annurev.ms.12.080182.001331 ↗
24. Gastellóu E, García G, Herrera AM et al (2019) A brief review of growth techniques for obtaining of III-V semiconductor compounds. Eur J Eng Res Sci 4:17–21. https://doi.org/10.24018/ejers.2019.4.9.147710.24018/ejers.2019.4.9.1477 ↗
25. Astié V, Millon C, Decams J-M, Bartasyte A (2019) Direct liquid injection chemical vapor deposition. In: Chemical vapor deposition for nanotechnology. IntechOpen. https://doi.org/10.5772/intechopen.8024410.5772/intechopen.80244 ↗
26. Pedersen H, Elliott SD (2014) Studying chemical vapor deposition processes with theoretical chemistry. Theor Chem Acc 133:1–10. https://doi.org/10.1007/s00214-014-1476-710.1007/s00214-014-1476-7 ↗
27. Vahlas C, Caussat B, Serp P, Angelopoulos GN (2006) Principles and applications of CVD powder technology. Mater Sci Eng R Rep 53:1–72. https://doi.org/10.1016/j.mser.2006.05.00110.1016/j.mser.2006.05.001 ↗
28. Hampden-Smith MJ, Kodas TT (1995) Chemical vapor deposition of metals: part 1. An overview of CVD processes. Chem Vap Depos 1:8–23. https://doi.org/10.1002/cvde.1995001010310.1002/cvde.19950010103 ↗
29. Sun L, Yuan G, Gao L et al (2021) Chemical vapour deposition. Nat Rev Methods Prim 1:5. https://doi.org/10.1038/s43586-020-00005-y10.1038/s43586-020-00005-y ↗
30. Choy KL (2003) Chemical vapour deposition of coatings. Prog Mater Sci 48:57–170. https://doi.org/10.1016/S0079-6425(01)00009-310.1016/S0079-6425(01)00009-3 ↗
31. Mubarak A, Hamzah E, Toff MRM (2005) Review of physical vapour deposition (PVD) techniques for hard coating. J Mek 20:42–51
32. Martin PM (2009) Handbook of deposition technologies for films and coatings: science, applications and technology. William Andrew
33. Mavukkandy MO, McBride SA, Warsinger DM et al (2020) Thin film deposition techniques for polymeric membranes– a review. J Memb Sci 610:118258. https://doi.org/10.1016/j.memsci.2020.11825810.1016/j.memsci.2020.118258 ↗
34. Abegunde OO, Akinlabi ET, Oladijo OP et al (2019) Overview of thin film deposition techniques. AIMS Mater Sci 6:174–199. https://doi.org/10.3934/MATERSCI.2019.2.17410.3934/MATERSCI.2019.2.174 ↗
35. Gudmundsson JT (2020) Physics and technology of magnetron sputtering discharges. Plasma Sour Sci Technol 29:113001. https://doi.org/10.1088/1361-6595/abb7bd10.1088/1361-6595/abb7bd ↗
36. Maurya D, Sardarinejad A, Alameh K (2014) Recent developments in R.F. magnetron sputtered thin films for pH sensing applications—an overview. Coatings 4:756–771. https://doi.org/10.3390/coatings404075610.3390/coatings4040756 ↗
37. Safi I (2000) Recent aspects concerning DC reactive magnetron sputtering of thin films: a review. Surf Coat Technol 127:203–218. https://doi.org/10.1016/s0257-8972(00)00566-110.1016/s0257-8972(00)00566-1 ↗
38. Schiller S, Goedicke K, Reschke J et al (1993) Pulsed magnetron sputter technology. Surf Coat Technol 61:331–337. https://doi.org/10.1016/0257-8972(93)90248-M10.1016/0257-8972(93)90248-M ↗
39. Sarakinos K, Alami J, Konstantinidis S (2010) High power pulsed magnetron sputtering: a review on scientific and engineering state of the art. Surf Coat Technol 204:1661–1684. https://doi.org/10.1016/j.surfcoat.2009.11.01310.1016/j.surfcoat.2009.11.013 ↗
40. Prabaswara A, Birch J, Junaid M et al (2020) Review of GaN thin film and nanorod growth using magnetron sputter epitaxy. Appl Sci 10:3050. https://doi.org/10.3390/app1009305010.3390/app10093050 ↗
41. Liang J, Liu Q, Li T et al (2021) Magnetron sputtering enabled sustainable synthesis of nanomaterials for energy electrocatalysis. Green Chem 23:2834–2867. https://doi.org/10.1039/D0GC03994B10.1039/D0GC03994B ↗
42. Ellmer K (2000) Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties. J Phys D Appl Phys 33:R17–R32. https://doi.org/10.1088/0022-3727/33/4/20110.1088/0022-3727/33/4/201 ↗
43. Wasa K, Kanno I, Kotera H (2012) Handbook of sputter deposition technology: fundamentals and applications for functional thin films, nano-materials and MEMS, Second Edition
44. Tan X, Liu J-Y, Niu J et al (2018) Recent progress in magnetron sputtering technology used on fabrics. Materials (Basel) 11:1953. https://doi.org/10.3390/ma1110195310.3390/ma11101953 ↗
45. Swann S (2000) Magnetron sputtering source. Met Finish 98:76. https://doi.org/10.1016/S0026-0576(01)80079-910.1016/S0026-0576(01)80079-9 ↗
46. Sarkar J (2014) Sputtering and thin film deposition. In: Sputtering materials for VLSI and thin film devices. Elsevier, pp 93–17010.1016/B978-0-8155-1593-7.00002-3 ↗
47. Zhang H, Cherng JS, Chen Q (2019) Recent progress on high power impulse magnetron sputtering (HiPIMS): the challenges and applications in fabricating VO2 thin film. AIP Adv 9:035242. https://doi.org/10.1063/1.508403110.1063/1.5084031 ↗
48. Wu H, Tian Q, Tian X et al (2019) Enhancement of discharge and deposition rate in dual-pulse pulsed magnetron sputtering: Effect of ignition pulse width. Surf Coat Technol 374:383–392. https://doi.org/10.1016/j.surfcoat.2019.06.01610.1016/j.surfcoat.2019.06.016 ↗
49. Shi Z, Wang Y, Du C et al (2012) Silicon nitride films for the protective functional coating: blood compatibility and biomechanical property study. J Mech Behav Biomed Mater 16:9–20. https://doi.org/10.1016/j.jmbbm.2012.06.02010.1016/j.jmbbm.2012.06.020 ↗
50. Signore MA, Sytchkova A, Dimaio D et al (2012) Deposition of silicon nitride thin films by RF magnetron sputtering: a material and growth process study. Opt Mater (Amst) 34:632–638. https://doi.org/10.1016/j.optmat.2011.09.01210.1016/j.optmat.2011.09.012 ↗
51. Dante RC, Kajdas CK (2012) A review and a fundamental theory of silicon nitride tribochemistry. Wear 288:27–38. https://doi.org/10.1016/j.wear.2012.03.00110.1016/j.wear.2012.03.001 ↗
52. Wiederhorn SM, Ferber MK (2001) Silicon nitride for gas turbines. Curr Opin Solid State Mater Sci 5:311–316. https://doi.org/10.1016/S1359-0286(00)00032-210.1016/S1359-0286(00)00032-2 ↗
53. Chuang WH, Fettig RK, Ghodssi R (2005) An electrostatic actuator for fatigue testing of low-stress LPCVD silicon nitride thin films. Sens Actuators A Phys 121:557–565. https://doi.org/10.1016/j.sna.2005.03.02610.1016/j.sna.2005.03.026 ↗
54. Kulczyk-Malecka J, Kelly PJ, West G et al (2014) Diffusion studies in magnetron sputter deposited silicon nitride films. Surf Coat Technol 255:37–42. https://doi.org/10.1016/j.surfcoat.2013.11.02710.1016/j.surfcoat.2013.11.027 ↗
55. Abels C, Mastronardi VM, Guido F et al (2017) Nitride-based materials for flexible mems tactile and flow sensors in robotics. Sensors 17:1–25. https://doi.org/10.3390/S1705108010.3390/S17051080 ↗
56. Masuda A, Umemoto H, Matsumura H (2006) Various applications of silicon nitride by catalytic chemical vapor deposition for coating, passivation and insulating films. Thin Solid Films 501:149–153. https://doi.org/10.1016/j.tsf.2005.07.17210.1016/j.tsf.2005.07.172 ↗
57. Klemm H (2010) Silicon nitride for high-temperature applications. J Am Ceram Soc 93:1501–1522. https://doi.org/10.1111/j.1551-2916.2010.03839.x10.1111/j.1551-2916.2010.03839.x ↗
58. Tiron V, Velicu IL, Pana I et al (2018) HiPIMS deposition of silicon nitride for solar cell application. Surf Coat Technol 344:197–203. https://doi.org/10.1016/j.surfcoat.2018.03.02510.1016/j.surfcoat.2018.03.025 ↗
59. Huang H, Winchester KJ, Suvorova A et al (2006) Effect of deposition conditions on mechanical properties of low-temperature PECVD silicon nitride films. Mater Sci Eng A 435–436:453–459. https://doi.org/10.1016/j.msea.2006.07.01510.1016/j.msea.2006.07.015 ↗
60. Skjöldebrand C, Schmidt S, Vuong V et al (2017) Influence of substrate heating and nitrogen flow on the composition, morphological and mechanical properties of SiNx coatings aimed for joint replacements. Materials (Basel) 10:173. https://doi.org/10.3390/ma1002017310.3390/ma10020173 ↗
61. Oliveira A, Cavaleiro A, Vieira MT (1993) Production and characterization of Si–N films obtained by r.f. magnetron sputtering. Surf Coat Technol 60:463–467. https://doi.org/10.1016/0257-8972(93)90133-910.1016/0257-8972(93)90133-9 ↗
62. Morin P, Raymond G, Benoit D et al (2012) A comparison of the mechanical stability of silicon nitride films deposited with various techniques. Appl Surf Sci 260:69–72. https://doi.org/10.1016/j.apsusc.2012.04.00310.1016/j.apsusc.2012.04.003 ↗
63. Taylor JA (1991) The mechanical properties and microstructure of plasma enhanced chemical vapor deposited silicon nitride thin films. J Vac Sci Technol A Vacuum Surf Film 9:2464–2468. https://doi.org/10.1116/1.57725710.1116/1.577257 ↗
64. Walmsley BA, Liu Y, Hu XZ et al (2005) Effects of deposition temperature on the mechanical and physical properties of silicon nitride thin films. J Appl Phys 98:044904. https://doi.org/10.1063/1.200697210.1063/1.2006972 ↗
65. Chen N, Shen B, Yang G, Sun F (2013) Tribological and cutting behavior of silicon nitride tools coated with monolayer- and multilayer-microcrystalline HFCVD diamond films. Appl Surf Sci 265:850–859. https://doi.org/10.1016/j.apsusc.2012.11.13310.1016/j.apsusc.2012.11.133 ↗
66. Toivola Y, Thurn J, Cook RF et al (2003) Influence of deposition conditions on mechanical properties of low-pressure chemical vapor deposited low-stress silicon nitride films. J Appl Phys 94:6915–6922. https://doi.org/10.1063/1.162277610.1063/1.1622776 ↗
67. Depla D, Colpaert A, Eufinger K et al (2002) Target voltage behaviour during DC sputtering of silicon in an argon/nitrogen mixture. Vacuum 66:9–17. https://doi.org/10.1016/S0042-207X(01)00415-810.1016/S0042-207X(01)00415-8 ↗
68. Yao ZQ, Yang P, Huang N et al (2006) Fabrication and surface characterization of pulsed reactive closed-field unbalanced magnetron sputtered amorphous silicon nitride films. Surf Coat Technol 200:4144–4151. https://doi.org/10.1016/j.surfcoat.2004.12.00710.1016/j.surfcoat.2004.12.007 ↗
69. Yau B-S, Huang J-L (2004) Effects of nitrogen flow on R.F. reactive magnetron sputtered silicon nitride films on high speed steel. Surf Coatings Technol 176:290–295. https://doi.org/10.1016/S0257-8972(03)00768-010.1016/S0257-8972(03)00768-0 ↗
70. Vila M, Cáceres D, Prieto C (2003) Mechanical properties of sputtered silicon nitride thin films. J Appl Phys 94:7868. https://doi.org/10.1063/1.162679910.1063/1.1626799 ↗
71. Yen BK, White RL, Waltman RJ et al (2003) Microstructure and properties of ultrathin amorphous silicon nitride protective coating. J Vac Sci Technol A Vacuum Surf Film 21:1895–1904. https://doi.org/10.1116/1.161597410.1116/1.1615974 ↗
72. Bharani GS, Sharma S (2023) Magnetron sputtered thin films based on transition metal nitride: structure and properties. Phys Status Solidi. https://doi.org/10.1002/pssa.20220022910.1002/pssa.202200229 ↗
73. Aissani L, Alhussein A, Zia AW et al (2022) Magnetron sputtering of transition metal nitride thin films for environmental remediation. Coatings 12:1746. https://doi.org/10.3390/coatings1211174610.3390/coatings12111746 ↗
74. Schmidt S, Hänninen T, Goyenola C et al (2016) SiN x coatings deposited by reactive high power impulse magnetron sputtering: process parameters influencing the nitrogen content. ACS Appl Mater Interfaces 8:20385–20395. https://doi.org/10.1021/acsami.6b0583010.1021/acsami.6b05830 ↗
75. Yao ZQ, Yang P, Huang N et al (2005) Composition, structure and properties of SiNx films fabricated by pulsed reactive closed-field unbalanced magnetron sputtering. Nucl Instrum Methods Phys Res Sect B Beam Interact Mater Atoms 240:741–751. https://doi.org/10.1016/j.nimb.2005.06.00410.1016/j.nimb.2005.06.004 ↗
76. Ding W, Xu J, Lu W et al (2010) Influence of N2 flow rate on the mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering. Thin Solid Films 518:2077–2081. https://doi.org/10.1016/j.tsf.2009.07.19110.1016/j.tsf.2009.07.191 ↗
77. Pettersson M, Tkachenko S, Schmidt S et al (2013) Mechanical and tribological behavior of silicon nitride and silicon carbon nitride coatings for total joint replacements. J Mech Behav Biomed Mater 25:41–47. https://doi.org/10.1016/j.jmbbm.2013.05.00210.1016/j.jmbbm.2013.05.002 ↗
78. Hardwick DA (1987) The mechanical properties of thin films: A review. Thin Solid Films 154:109–124. https://doi.org/10.1016/0040-6090(87)90357-910.1016/0040-6090(87)90357-9 ↗
79. Kaiser N (2001) Review of fundamentals of thin film growth. Opt InfoBase Conf Pap. https://doi.org/10.1364/ao.41.00305310.1364/ao.41.003053 ↗
80. Schmidt S, Hänninen T, Wissting J et al (2017) SiNx coatings deposited by reactive high power impulse magnetron sputtering: Process parameters influencing the residual coating stress. J Appl Phys 121:171904. https://doi.org/10.1063/1.497781210.1063/1.4977812 ↗
81. Pogrebnyak AD, Shpak AP, Azarenkov NA, Beresnev VM (2009) Structures and properties of hard and superhard nanocomposite coatings. Phys Usp 52:29–54. https://doi.org/10.3367/ufne.0179.200901b.003510.3367/ufne.0179.200901b.0035 ↗
82. da Silva ZL, Domingues Mansano R, Paula Mousinho A (2009) Low-temperature deposition of silicon oxide and silicon nitride by reactive magnetron sputtering. Microelectronics J 40:66–69. https://doi.org/10.1016/j.mejo.2008.07.01710.1016/j.mejo.2008.07.017 ↗
83. Pettersson M, Berlind T, Schmidt S et al (2013) Structure and composition of silicon nitride and silicon carbon nitride coatings for joint replacements. Surf Coat Technol 235:827–834. https://doi.org/10.1016/j.surfcoat.2013.09.00810.1016/j.surfcoat.2013.09.008 ↗
84. Liang HY, Zhao QN, Gao F et al (2011) Effect of RF sputtering power on the structural, optical and hydrophobic properties of SiNx thin film. Adv Mater Res 194–196:2340–2346. https://doi.org/10.4028/www.scientific.net/AMR.194-196.234010.4028/www.scientific.net/AMR.194-196.2340 ↗
85. Kim JH, Chung KW (1998) Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering. J Appl Phys 83:5831–5839. https://doi.org/10.1063/1.36744010.1063/1.367440 ↗
86. Filho L, Schmidt S, Leifer K et al (2019) Towards functional silicon nitride coatings for joint replacements. Coatings 9:1–10. https://doi.org/10.3390/COATINGS902007310.3390/COATINGS9020073 ↗
87. Al-Asadi MM, Al-Tameemi HA (2022) A review of tribological properties and deposition methods for selected hard protective coatings. Tribol Int 176:107919. https://doi.org/10.1016/j.triboint.2022.10791910.1016/j.triboint.2022.107919 ↗
88. Zhang S, Sun D, Fu Y, Du H (2003) Recent advances of superhard nanocomposite coatings: a review. Surf Coat Technol 167:113–119. https://doi.org/10.1016/S0257-8972(02)00903-910.1016/S0257-8972(02)00903-9 ↗
89. Martínez-Martínez D (2013) Nanocomposite coatings. In: Wang QJ, Chung Y-W (eds) Encyclopedia of tribology. Springer, US, Boston, MA, pp 2359–236410.1007/978-0-387-92897-5_710 ↗
90. Santo L, Davim JP (2012) Nanocomposite coatings: a review. In: Materials and surface engineering. Elsevier, pp 97–12010.1533/9780857096036.97 ↗
91. Musil J, Zeman P (2007) Hard a-Si3N4/MeNx nanocomposite coatings with high thermal stability and high oxidation resistance. Solid State Phenom 127:31–36. https://doi.org/10.4028/www.scientific.net/SSP.127.3110.4028/www.scientific.net/SSP.127.31 ↗
92. Vepřek S, Haussmann M, Reiprich S et al (1996) Novel thermodynamically stable and oxidation resistant superhard coating materials. Surf Coat Technol 86–87:394–401. https://doi.org/10.1016/S0257-8972(96)02988-X10.1016/S0257-8972(96)02988-X ↗
93. Lu C, Mai YW, Shen YG (2006) Recent advances on understanding the origin of superhardness in nanocomposite coatings: a critical review. J Mater Sci 41:937–95010.1007/s10853-006-6577-9 ↗
94. Guha S, Bandyopadhyay A, Das S, Swain BP (2018) Synthesis and characterization of Titanium Silicon Nitride (TiSiN) thin film: a review. IOP Conf Ser Mater Sci Eng. https://doi.org/10.1088/1757-899X/377/1/01218110.1088/1757-899X/377/1/012181 ↗
95. Villate JJ, Vera E, Olaya JJ (2019) Behavior to wear and corrosion of steel with chromium silicon nitride coatings. J Phys Conf Ser. https://doi.org/10.1088/1742-6596/1386/1/01201810.1088/1742-6596/1386/1/012018 ↗
96. Zenkin S, Konusov F, Lauk A et al (2019) Structure, mechanical and optical properties of silicon-rich Al–Si–N films prepared by high power impulse magnetron sputtering. Coatings. https://doi.org/10.3390/coatings901005310.3390/coatings9010053 ↗
97. Musil J, Javdošňák D, Čerstvý R et al (2016) Effect of energy on the formation of flexible hard Al–Si–N films prepared by magnetron sputtering. Vacuum 133:43–45. https://doi.org/10.1016/j.vacuum.2016.08.01410.1016/j.vacuum.2016.08.014 ↗
98. Mishra SK, Kumari S, Soni, (2017) Development of hard and optically transparent Al–Si–N nanocomposite coatings. Surf Interface Anal 49:345–348. https://doi.org/10.1002/sia.595410.1002/sia.5954 ↗
99. Akhter R, Zhou Z, Xie Z, Munroe P (2021) TiN versus TiSiN coatings in indentation, scratch and wear setting. Appl Surf Sci 563:150356. https://doi.org/10.1016/j.apsusc.2021.15035610.1016/j.apsusc.2021.150356 ↗
100. Sergeev V, Psakhie S, Chubik P et al (2017) Magnetron sputtering of Si–Al–N nanocomposite coatings on quartz for protection against impacts of high speed microparticles. Vacuum 143:454–457. https://doi.org/10.1016/j.vacuum.2017.06.01810.1016/j.vacuum.2017.06.018 ↗