Atomic-level surface finishing of fused silica using modified SiO2 slurry and its polishing mechanism
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OpenAlex topics: Advanced Surface Polishing Techniques · Laser Material Processing Techniques · Silicon and Solar Cell Technologies
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References (49)
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1. Hybrid laser precision engineering of transparent hard materials: challenges, solutions and applications10.1038/s41377-021-00596-5 ↗
2. Low-damage optical manufacturing via plasma finishing and figuring10.1016/j.jmatprotec.2024.118633 ↗
3. Effects of the deflection angle of the indenter on the material removal and damage evolution of fused silica during scratching10.1016/j.jmapro.2024.03.037 ↗
4. Two-photon polymerization of nanocomposites for the fabrication of transparent fused silica glass microstructures
5. Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass10.1016/j.jmrt.2024.12.056 ↗
6. Nanoscale tribological aspects of chemical mechanical polishing: a review10.1016/j.apsadv.2022.100286 ↗
7. In situ spectroscopic insights into the redox and acid-base properties of ceria catalysts10.1016/S1872-2067(21)63806-8 ↗
8. Innovative synthesis of CeO2 nanoparticles for advanced chemical mechanical polishing10.1016/j.colsurfa.2024.135764 ↗
9. Impact of atomic defects on ceria surfaces on chemical mechanical polishing of silica glass surfaces10.1021/acs.langmuir.3c03557 ↗
10. Two material removal modes in chemical mechanical polishing: mechanical plowing vs. chemical bonding10.1007/s40544-023-0799-6 ↗
11. Edge finishing of large turbine casings using defined multi-edge and abrasive tools in automated cells10.1007/s00170-021-08087-y ↗
12. Atomic-scale surface of fused silica induced by chemical mechanical polishing with controlled size spherical ceria abrasives10.1016/j.jmapro.2022.12.008 ↗
13. A review on the development of ceria for chemical mechanical polishing10.1016/j.powtec.2024.119989 ↗
14. Systematic root cause analysis of ceria-induced defects during chemical mechanical planarization and cleaning10.1016/j.jmapro.2024.07.102 ↗
15. Cerium contamination on silicon carbide optics during CMP: TOF-SIMS, XPS characterization, and ReaxFF MD simulation10.1016/j.apsusc.2025.163390 ↗
16. Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical–mechanical polishing mechanism10.1016/j.apsusc.2019.144041 ↗
17. A comprehensive review of the nano-abrasives key parameters influencing the performance in chemical mechanical polishing10.3390/nano15171366 ↗
18. Zirconium and/or cerium-containing mesoporous silica as functional active abrasive particles for radical-facilitated chemical mechanical polishing10.1016/j.jallcom.2024.178090 ↗
19. A review on chemical and mechanical phenomena at the wafer interface during chemical mechanical planarization10.1557/s43578-020-00060-x ↗
20. Molecular dynamics computer simulations of silica surface structure and adsorption of water molecules10.1016/0022-3093(90)90184-N ↗
21. Evaluating water reactivity at silica surfaces using reactive potentials10.1021/acs.jpcc.7b12653 ↗
22. ReaxFF molecular dynamics simulations of hydroxylation kinetics for amorphous and nano-silica structure and its relations with atomic strain energy10.1021/acs.jpcc.5b09784 ↗
23. Investigation of the chemical residuals on the fused silica during chemical mechanical polishing10.1002/slct.201801163 ↗
24. New atomistic insights on the chemical mechanical polishing of silica glass with ceria nanoparticles10.1021/acs.langmuir.3c00304 ↗
25. Tight-binding quantum chemical molecular dynamics simulation of mechano-chemical reactions during chemical–mechanical polishing of SiO2 surface by CeO2 particle10.1016/j.apsusc.2004.09.126 ↗
26. A sustainable process for material removal on pure copper by use of extremophile bacteria10.1016/j.jclepro.2014.01.061 ↗
27. Evolution of ring structures and method for inhibition in polishing of fused silica10.1016/j.apsusc.2023.158830 ↗
28. Molecular dynamics simulations addressing atomic-scale core issues in chemical mechanical polishing and post-CMP cleaning: a concise review
29. Fast parallel algorithms for short-range molecular dynamics10.1006/jcph.1995.1039 ↗
30. Visualization and analysis of atomistic simulation data with OVITO - the Open visualization tool10.1088/0965-0393/18/1/015012 ↗
31. Canonical dynamics: equilibrium phase-space distributions10.1103/PhysRevA.31.1695 ↗
32. Atomic-scale insights into the material removal mechanism of cerium oxide polished fused silica based on ReaxFF-MD10.1016/j.jmapro.2024.10.068 ↗
33. Review on chemical mechanical polishing for atomic surfaces using advanced rare earth abrasives10.1088/1361-6463/ad8453 ↗
34. Investigation of nanoparticle dispersibility and stability based on TiO2 analysis by SMLS, DLS, and SEM10.1007/s11051-024-05959-8 ↗
35. Size distribution monitoring for chemical mechanical polishing slurries: an intercomparison of electron microscopy, dynamic light scattering, and differential mobility analysis10.1016/j.powtec.2021.10.045 ↗
36. Techniques for analysing nanotopography on polished silicon wafers10.1016/S0167-9317(00)00513-X ↗
37. Accuracy verification methodology for computer-generated hologram used for testing a 3.5-meter mirror based on an equivalent element
38. Research on the generation mechanism of surface and subsurface damage in loose abrasive lapping of RB-SiC ceramics10.1364/OE.539765 ↗
39. Analysis of the smoothing characteristics and shape-retaining ability of conformal vibration polishing and suppression strategy for full-spatial frequency errors of optics10.1364/AO.460786 ↗
40. Optimization of dynamic characteristics for time-controlled grinding using time-varying removal function10.1016/j.jmapro.2024.04.018 ↗
41. Preparation of CeO2 polishing powder and its performance and mechanism for chemical mechanical polishing of optical glass10.1021/acsami.4c21540 ↗
42. Enhancing polishing property of CeO2-based abrasives by co-doping with lanthanide and fluorine
43. Phosphate-functionalized CeO2 nanosheets for efficient catalytic oxidation of dichloromethane10.1021/acs.est.8b05002 ↗
44. XRD and XPS studies of room temperature spontaneous interfacial reaction of CeO2 thin films on Si and Si3N4 substrates10.1039/C4RA09882J ↗
45. Impact of atomic defects on ceria surfaces on chemical mechanical polishing of silica glass surfaces10.1021/acs.langmuir.3c03557 ↗
46. Machining performance and material removal mechanism of sapphire with novel polishing slurry10.1016/j.apsusc.2024.160756 ↗
47. Preparation of the cutting edge on broaching tools by brushing-polishing with ceramic brushes: analysis and prediction of effects
48. A novel atomic removal model for chemical mechanical polishing using developed mesoporous shell/core abrasives based on molecular dynamics10.1039/D3NR04420C ↗
49. Atomic surface of fused silica and polishing mechanism interpreted by molecular dynamics and density functional theory