Ni hetero-alloying electrodes for 4H-SiC pressure sensor over wide temperature range: interfacial dynamics and leadless integration
Source abstract
Abstract
Interfacial thermal degradation of ohmic contacts and the instability of packaging structures constitute the primary bottlenecks compromising the reliability of 4H-SiC piezoresistive pressure sensors in harsh environments. In this study, molecular dynamics simulations were employed to elucidate the atomic-level kinetic mechanisms underlying the ohmic transition at the Ni/SiC heterointerface. Guided by comparative experimental analysis, a Ni/TiW/TaN-Au/TiW/Au composite electrode system was developed. This system achieved a low contact resistivity of 8.31×10 -5 Ω·cm 2 while exhibiting excellent electrical stability at 600°C. Surface analysis and depth profiling revealed that bulk atomic interdiffusion, driven by oxygen intrusion along grain boundaries, serves as the dominant mechanism governing electrode failure at elevated temperatures. Furthermore, elemental and simultaneous thermal analyses were utilized to characterize the composition and thermal rheological properties of the glass paste, facilitating the design of a stepped integrated sintering process. This approach enabled the leadless hermetic interconnection of the pressure sensor chip, eliminating fracture risks associated with traditional wire bonding. A variable-temperature pressure calibration platform was established to conduct static calibration tests from -50°C to 450°C. A surface reconstruction algorithm was introduced to decouple pressure-temperature cross-sensitivity and compensate for repeatable nonlinearity and thermal drift under calibrated conditions. The sensor's performance metrics under extreme conditions were significantly enhanced. The sensor successfully withstood a continuous 20h survival test, validating its engineering potential for pressure sensing in extreme environments.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Silicon Carbide Semiconductor Technologies · Diamond and Carbon-based Materials Research · Magnetic Field Sensors Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (49)
Show source-provided references
1. A technical review of the laser drilling of aerospace materials10.1016/0924-0136(94)90073-6 ↗
2. A review of principles of MEMS pressure sensing with its aerospace applications
3. SiC sensors: a review10.1088/0022-3727/40/20/S17 ↗
4. Prospects for SiC electronics and sensors10.1016/S1369-7021(07)70348-6 ↗
5. Advances in silicon carbide science and technology at the micro- and nanoscales10.1116/1.4807902 ↗
6. Silicon carbide for MEMS and NEMS-an overview
7. Fraga · 2014 · vol. 19 · 274
8. 4H-SiC integrated circuits for high-temperature applications10.1016/j.jcrysgro.2022.127060 ↗
9. Analysis of 4H-SiC MOSFET with distinct high-k/4H-SiC interfaces under high temperature and carrier-trapping conditions10.1007/s00339-020-03850-6 ↗
10. Very high temperature hall sensors in a wafer‐scale 4H‐SiC technology10.1002/admt.202400046 ↗
11. Highly sensitive 4H-SiC pressure sensor at cryogenic and elevated temperatures10.1016/j.matdes.2018.07.014 ↗
12. Recent progress in ohmic contacts to silicon carbide for high-temperature applications10.1007/s11664-015-4107-8 ↗
13. Ta/Ni/Ta multilayered ohmic contacts on n-type SiC10.1016/j.apsusc.2007.06.022 ↗
14. Electrical evolution of W and WC schottky contacts on 4H-SiC at different annealing temperatures
15. Role of Ti and W in the Ni-based ohmic contacts to n-type 4H-SiC10.1016/j.jcrysgro.2023.127084 ↗
16. High-temperature reliability of Ni/Nb ohmic contacts on 4H-SiC for harsh environment applications10.1016/j.tsf.2018.11.014 ↗
17. Improved ohmic contact to the n-type 4H-SiC semiconductor using cobalt silicides10.1088/0268-1242/19/3/003 ↗
18. Work function tuning of nickel silicide by co-sputtering nickel and silicon - art. no. 17190810.1063/1.2115072 ↗
19. Ohmic contact formation mechanism of Ni on-type 4H-SiC10.1063/1.1404998 ↗
20. Improved Ni based composite ohmic contact to SiC for high temperature and high power device applications10.1063/1.1287776 ↗
21. Ni-Based ohmic contacts to N-Type 4H-SiC: the formation mechanism and thermal stability
22. Role of W in W/Ni bilayer ohmic contact to n-Type 4H-SiC from the perspective of device applications10.1109/TED.2017.2784098 ↗
23. Thermal stability study of n-type and p-type ohmic contacts simultaneously formed on 4H-SiC10.1016/j.jallcom.2017.10.086 ↗
24. Ta–Ru–N diffusion barriers for high-temperature contacts to p-type SiC10.1016/j.tsf.2005.04.005 ↗
25. Fabrication of ohmic contact on semi-insulating 4H-SiC substrate by laser thermal annealing10.1063/1.4953778 ↗
26. Manufacturability and reliability optimization for metallization of SiC piezoresistive pressure sensors10.1007/s10854-021-06297-4 ↗
27. High-temperature reliability of integrated circuit based on 4H-SiC MOSFET with Ni/Nb ohmic contacts for harsh environment applications10.35848/1347-4065/abc924 ↗
28. Review on materials, microsensors, systems and devices for high-temperature and harsh-environment applications
29. The sintering process and vibration characteristics for leadless package structure of pressure sensors10.1109/TCPMT.2021.3137518 ↗
30. Ned · 2004
31. Reliability evaluation of direct chip attached silicon carbide pressure transducers10.1109/ICSENS.2004.1426246 ↗
32. Pressure sensors based on the third-generation semiconductor silicon carbide: a comprehensive review10.1016/j.eng.2024.12.036 ↗
33. Phosphate glasses as alternatives to Pb-based sealing frits10.1016/S0022-3093(99)00678-X ↗
34. Fabrication of lead-free low melting temperature TeO-VO-CuO glasses and wetting behavior on AlN ceramic substrate10.1016/j.jeurceramsoc.2020.07.015 ↗
35. Nonlinear piezoresistive effect of 4H-SiC for applications of high temperature pressure sensors
36. Investigation on piezoresistive effect of n-Type 4H-SiC based on All-SiC pressure sensors10.1109/JSEN.2022.3153630 ↗
37. Short-pulse laser and plasma etching composite micromachining for realizing high-accuracy SiC pressure sensor10.1109/TED.2025.3539647 ↗
38. Shallow trench isolation structure design for through-silicon vias stress reduction10.1002/jnm.2988 ↗
39. Cohen · 1982 · vol. 18 · 361
40. A review on the radial distribution function: insights into molecular structure, intermolecular interactions, and thermodynamic properties10.1016/j.molliq.2025.127900 ↗
41. Catalytic graphitization and ohmic contact formation on 4H-SiC10.1063/1.1562737 ↗
42. Intrinsic properties and barrier behaviors of thin films of sputter-deposited single-layered and alternately layered tantalum nitrides (Ta2 N/TaN)10.1149/1.1383073 ↗
43. Accurate heat (fourier) and mass (fick and thermodiffusion) multicomponent transport at similar cost as mixture-averaged approximation10.1016/j.combustflame.2022.112599 ↗
44. Evaluation of silicon carbide pressure sensor in turbofan engine core exhaust nozzle
45. All-SiC fiber-optic sensor for pressure and temperature dual-mode sensing in harsh environments10.1016/j.sna.2024.115388 ↗
46. Exploring the nonlinear piezoresistive effect of 4H-SiC and developing MEMS pressure sensors for extreme environments10.1038/s41378-023-00496-1 ↗
47. High-sensitivity 4H-Silicon carbide MEMS pressure sensors for extreme temperature ranges of-75° C to 600° C
48. Development of All-SiC absolute pressure sensor based on sealed cavity structure10.1109/JSEN.2021.3121882 ↗
49. SiC cavity-based pressure sensor with high dynamic range10.1109/JSEN.2025.3586120 ↗